Slingerlands, NY, United States of America

Cornelius Brown Peethala

This inventor holds 75 USPTO granted patents and 7 published patent applications and 1 EPO patent, primarily in Metal Interconnects (CPC class H01L). Top assignees: International Business Machines Corporation, Adeia Semiconductor Bonding Technologies Inc., Elpis Technologies Inc.. Active years: 2017-2026.

USPTO Granted Patents = 75 

% Patents Active = 53.3

 

Average Co-Inventor Count = 4.3

ph-index = 6

Forward Citations = 145(Granted Patents)

Forward Citations (Not Self Cited) = 116(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Albany, NY (US) (2017 - 2020)
  • Singerlands, NY (US) (2020)
  • Slingerlands, NY (US) (2019 - 2023)

Company Filing History:


Years Active: 2017-2026

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Areas of Expertise:
Dielectric Processing
BEOL Structures
Metal Interconnects
Selective Deposition
Patterning Integration
Conductive Regions
Chemical Mechanical Polishing
Interconnect Reliability
Dual Damascene
Metal Spacer
Via-to-Line Spacer
Trench Alignment Marks
75 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Cornelius Brown Peethala

Introduction

Cornelius Brown Peethala, based in Slingerlands, NY, is a prolific inventor with a remarkable portfolio of 70 patents. His expertise spans various innovations in semiconductor processing, contributing significantly to advancements in the manufacturing of integrated circuits and enhancing the efficiency of wafer processing.

Latest Patents

Among his latest patents is a method for embedded metal contamination removal from back-end-of-line (BEOL) wafers. This innovative approach involves a bevel dry etch technique that effectively breaks up layers of contaminants containing embedded metals. Following this, a sequence of wet etches is applied to ensure the bevel of the wafer is substantially free of contaminants. This technology addresses the challenge of damaged layers caused during metallization processes, presenting a novel solution for ensuring high-quality wafer surfaces.

Another noteworthy patent includes the development of bottom barrier-free interconnects. Peethala's design integrates metal lines within a dielectric, eliminating the need for a barrier layer between the interconnects and the metal lines. This advancement facilitates improved interconnect structures that are vital for enhancing the reliability and performance of semiconductor devices.

Career Highlights

Throughout his career, Cornelius has been associated with prestigious organizations such as IBM and GlobalFoundries Inc., where his contributions have driven significant technological advancements in the semiconductor industry. His innovative spirit and commitment to excellence have garnered respect and recognition in the field.

Collaborations

Cornelius has worked alongside notable colleagues like Raghuveer Reddy Patlolla and Chih-Chao Yang. These collaborations have played a crucial role in fostering innovation and transforming cutting-edge ideas into practical applications within the semiconductor domain.

Conclusion

Cornelius Brown Peethala continues to be a pivotal figure in the realm of semiconductor innovations, with a notable record of patents that reflect his dedication to advancing technology. His work not only enhances manufacturing processes but also sets the stage for future developments in the industry, marking him as an influential inventor in this ever-evolving field.

Profile summary based on public USPTO records.
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