Tainan, Taiwan

En-Chiuan Liou

This inventor holds 139 USPTO granted patents and 18 published patent applications, primarily in Semiconductor Technology (CPC class H01L21-823431). Top assignees: United Microelectronics Corp., Fujian Jinhua Integrated Circuit Co., Ltd.. Active years: 2013-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: En-Chiuan Liou. Retrieved from https://idiyas.com/inventor/en-chiuan-liou

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 139 

% Patents Active = 100.0

Average Co-Inventor Count = 2.7

ph-index = 10

Forward Citations = 396(Granted Patents)

Forward Citations (Not Self Cited) = 354(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Tainan County, TW (2013 - 2016)
  • Tainan, TW (2014 - 2022)

Company Filing History:


Years Active: 2013-2026

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Areas of Expertise:
Photomask Structure
Semiconductor Structure
Dynamic Random Access Memory
Integrated Circuit
Fabrication Method
Overlay Mark
Extreme Ultraviolet Mask
Die Seal Ring
Fin-Shaped Structures
Stability Evaluation
Pattern Transfer
Manufacturing Method
139 patents (USPTO):Explore Patents

Title: En-Chiuan Liou: A Pioneering Inventor from Tainan, Taiwan

Introduction:

En-Chiuan Liou, a brilliant innovator hailing from Tainan, Taiwan, has made significant contributions to the field of integrated circuits and semiconductor structures. With an impressive portfolio of 133 patents, Liou continues to push the boundaries of technological advancements. In this article, we will explore his latest patents, career highlights, and collaborations, shedding light on his remarkable achievements.

Latest Patents:

Among En-Chiuan Liou's recent patents, two stand out as groundbreaking advancements in the field of integrated circuit technology:

1. Integrated Circuit:

Liou's integrated circuit patent involves a unique manufacturing process. It encompasses a substrate with distinct areas, each covered by specific line patterns. By introducing sacrificial line patterns and slot patterns, Liou successfully achieves enhanced separation and orthogonality. This innovative approach offers improved integration capabilities in integrated circuit designs.

2. Manufacturing Method of Semiconductor Structure:

Liou's semiconductor structure patent focuses on manufacturing techniques for enhanced performance. By effectively doping the fin portions, recessed portions, and the substrate, Liou ensures optimal functionality of the overall structure. Additionally, the incorporation of a dielectric layer and careful alignment of surfaces contributes to the improved performance and efficiency of the semiconductor structure.

Career Highlights:

En-Chiuan Liou has made noteworthy contributions throughout his career at renowned semiconductor companies. Notable highlights include his work at:

1. United Microelectronics Corp (UMC):

During his tenure at UMC, Liou played a pivotal role in the development of cutting-edge integrated circuit technologies. His expertise in process innovation and optimization led to the successful execution of various projects, propelling UMC to the forefront of the semiconductor industry.

2. Fujian Jinhua Integrated Circuit Co., Ltd. (FJICC):

At FJICC, Liou continued to showcase his talents by spearheading key manufacturing processes and driving innovation. His relentless pursuit of excellence contributed significantly to the company's growth and recognition as a leading player in the semiconductor market.

Collaborations:

En-Chiuan Liou has had the pleasure of collaborating with accomplished professionals, further amplifying the impact of his inventions. Two notable individuals among his coworkers are:

1. Yu-Cheng Tung:

Liou's collaboration with Yu-Cheng Tung has led to the development of novel manufacturing techniques in semiconductor structures. Their combined expertise has laid the foundation for groundbreaking advancements in the industry.

2. Chih-Wei Yang:

Teaming up with Chih-Wei Yang, Liou has explored innovative approaches to integrated circuit design. Their synergistic efforts have resulted in patents that have revolutionized the field and garnered acclaim from experts worldwide.

Conclusion:

En-Chiuan Liou's remarkable prowess in the realm of integrated circuits and semiconductor structures has earned him a well-deserved reputation as a pioneering inventor. With a substantial patent portfolio and a trail of groundbreaking innovations, Liou continues to shape the future of technology. His contributions at companies like UMC and FJICC, along with his collaborations with esteemed colleagues, further solidify his position as a forefront figure in the field. As we eagerly anticipate his future endeavors, En-Chiuan Liou's impact on the industry will undoubtedly continue to inspire and shape the world of innovations and patents.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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