Mandyam Sriram

This inventor holds 59 USPTO granted patents and 23 published patent applications, primarily in Plasma Deposition (CPC class H01L). Top assignees: Novellus Systems Incorporated, Applied Materials, Inc., Intel Corporation. Active years: 2007-2026.

USPTO Granted Patents = 59 (Patent Applications = 23)

% Patents Active = 84.7

Average Co-Inventor Count = 5.6

ph-index = 19

Forward Citations = 2,619(Granted Patents)

Forward Citations (Not Self Cited) = 2,470(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Beaverton, OR (US) (2007 - 2017)
San Jose, CA (US) (2015 - 2024)

Company Filing History:

32 out of 993

Novellus Systems Incorporated

patents

26 out of 14,391

Applied Materials, Inc.

Years Active: 2007-2026

Loading Chart...

Areas of Expertise:

Plasma-Enhanced Deposition

Atomic Layer Deposition

Film Stacks

MOSFET Engineering

Conformal Dielectric Films

Gapfill Performance

Wafer Processing

Critical Dimension Control

In-Situ Deposition

Dielectric Selectivity

Titanium Nitride Etching

Spatial Separation

59 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12660271 - Method of reducing metal gate resistance for next generation NMOS device application (2026-06-16),

2. 12542256 - Batch processing chambers for plasma-enhanced deposition (2026-02-03),

3. 12463093 - Method of tuning film properties of metal nitride using plasma (2025-11-04),

4. 12385138 - Plasma-enhanced deposition of film stacks (2025-08-12),

5. 12305284 - Apparatus and methods for fine planar non-uniformity improvement (2025-05-20),

6. 12305278 - Method of reducing titanium nitride etching during tungsten film formation (2025-05-20),

7. 12230688 - MOSFET gate engineerinng with dipole films (2025-02-18),

8. 12114488 - Enhancing gapfill performance of dram word line (2024-10-08),

9. 12062545 - Fluorine-free tungsten ALD for dielectric selectivity improvement (2024-08-13),

10. 12051734 - PMOS high-k metal gates (2024-07-30),

11. 11923172 - Paired dynamic parallel plate capacitively coupled plasmas (2024-03-05),

12. 11894257 - Single wafer processing environments with spatial separation (2024-02-06),

13. 11887856 - Enhanced spatial ALD of metals through controlled precursor mixing (2024-01-30),

14. 11646226 - Method of tuning film properties of metal nitride using plasma (2023-05-09),

15. 11581213 - Susceptor wafer chucks for bowed wafers (2023-02-14),

Title: The Innovative Journey of Inventor Mandyam Sriram

Introduction: Mandyam Sriram, a distinguished inventor based in Beaverton, Oregon, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents: Mandyam Sriram holds several patents in the areas of artificial intelligence, machine learning, and robotics, showcasing his expertise in cutting-edge technologies.

Career Highlights: With a career spanning over two decades, Sriram has worked with leading tech companies, spearheading research and development projects that have pushed the boundaries of innovation.

Collaborations: Throughout his career, Mandyam Sriram has collaborated with top researchers, engineers, and scientists, fostering a culture of creativity and excellence in the projects he undertakes.

Conclusion: Inventor Mandyam Sriram's relentless pursuit of innovation and his passion for creating technology that shapes the future make him a true visionary in the world of inventions.