For the Inventor, By the Inventor

Enter inventor name

West Linn, OR, United States of America

Jon Henri

USPTO Granted Patents = 56 (Patent Applications = 13)

Average Co-Inventor Count = 4.3

ph-index = 30

Forward Citations = 5,857(Granted Patents)

Forward Citations (Not Self Cited) = 5,631(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Linn, OR (US) (2003)
West Linn, OR (US) (2002 - 2024)

Company Filing History:

Novellus Systems Incorporated

19 out of 3,777

Lam Research Corporation

Novelius Systems, Inc.

Lam Researh Corporation

Years Active: 2002-2025

Loading Chart...

Areas of Expertise:

Atomic Layer Deposition

Plasma Enhanced Deposition

Conformal Dielectric Films

High Aspect Ratio Features

Selective Deposition

Etch-Stop Layers

Silicon Nitride Films

Critical Dimension Control

Chalcogenide Materials

Hardmask Thin Films

Wafer Temperature Control

Diffusion Barriers

56 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12266535 - Mask encapsulation to prevent degradation during fabrication of high aspect ratio features (2025-04-01),

2. 12249514 - Carbon based depositions used for critical dimension control during high aspect ratio feature etches and for forming protective layers (2025-03-11),

3. 11869770 - Selective deposition of etch-stop layer for enhanced patterning (2024-01-09),

4. 11107683 - Selective growth of metal-containing hardmask thin films (2021-08-31),

5. 11094542 - Selective deposition of etch-stop layer for enhanced patterning (2021-08-17),

6. 11075127 - Suppressing interfacial reactions by varying the wafer temperature throughout deposition (2021-07-27),

7. 10804099 - Selective inhibition in atomic layer deposition of silicon-containing films (2020-10-13),

8. 10741458 - Methods for depositing films on sensitive substrates (2020-08-11),

9. 10643846 - Selective growth of metal-containing hardmask thin films (2020-05-05),

10. 10566194 - Selective deposition of etch-stop layer for enhanced patterning (2020-02-18),

11. 10347547 - Suppressing interfacial reactions by varying the wafer temperature throughout deposition (2019-07-09),

12. 10043655 - Plasma activated conformal dielectric film deposition (2018-08-07),

13. 10020188 - Method for depositing ALD films using halide-based precursors (2018-07-10),

14. 10008428 - Methods for depositing films on sensitive substrates (2018-06-26),

15. 9875891 - Selective inhibition in atomic layer deposition of silicon-containing films (2018-01-23),

Title: The Innovative Journey of Jon Henri

Introduction: Jon Henri, a visionary inventor based in West Linn, Oregon, has made significant contributions to the world of technology and innovation through his groundbreaking inventions.

Latest Patents: Jon Henri holds several patents in the field of renewable energy technologies, including a recent patent for a solar-powered water purification system that has the potential to provide clean drinking water in remote areas.

Career Highlights: With a background in mechanical engineering, Jon Henri has spent over two decades working in research and development, focusing on sustainable solutions for environmental challenges. His innovative approach has led to the development of cutting-edge technologies that have garnered international recognition.

Collaborations: Throughout his career, Jon Henri has collaborated with leading research institutions and universities to further his research and bring his inventions to market. His partnerships with industry experts have been instrumental in the success of his projects.

Conclusion: Jon Henri's passion for innovation and commitment to creating a more sustainable future have established him as a prominent figure in the world of inventors. His pioneering work continues to inspire the next generation of innovators to push the boundaries of what is possible.

This text is generated by artificial intelligence and may not be accurate.

Please report any incorrect information to support@idiyas.com

Loading…