The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2026
Filed:
May. 21, 2021
Lam Research Corporation, Fremont, CA (US);
Lee Chen, Cedar Creek, TX (US);
Ramesh Chandrasekharan, Portland, OR (US);
Shaun Tyler Smith, Portland, OR (US);
Yukinori Sakiyama, West Linn, OR (US);
Aaron Durbin, Portland, OR (US);
Jon Henri, West Linn, OR (US);
LAM RESEARCH CORPORATION, Fremont, CA (US);
Abstract
A substrate processing system includes a gas source, an RF source, and a light source. The gas source supplies a first gas to a process module of the substrate processing system. The RF source supplies RF power to the process module to generate plasma when the first gas is supplied to the process module of the substrate processing system. The light source is coupled to the process module to introduce light into the process module during the plasma generation.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile