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For the Inventor, By the Inventor

Portland, OR, United States of America

Ramesh Chandrasekharan

This inventor holds 58 USPTO granted patents and 36 published patent applications, primarily in Substrate Processing. Top assignees: Lam Research Corporation, Novellus Systems Incorporated, Lam Research Foundation. Active years: 2014-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ramesh Chandrasekharan. Retrieved from https://idiyas.com/inventor/ramesh-chandrasekharan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 58 

% Patents Active = 100.0

Average Co-Inventor Count = 4.9

ph-index = 11

Forward Citations = 2,094(Granted Patents)

Forward Citations (Not Self Cited) = 1,960(Dec 10, 2025)


Location History:

  • Tualatin, OR (US) (2015)
  • Portland, OR (US) (2014 - 2024)
  • Lake Oswego, OR (US) (2024)

Company Filing History:

goldMedal50 out of 3,940 
 
Lam Research Corporation
 patents
silverMedal6 out of 993 
 
Novellus Systems Incorporated
 patents
bronzeMedal1 out of 1 
 
Lam Research Foundation
 patent
4. 1 out of 834,453 
Other
 patents

Years Active: 2014-2026

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Areas of Expertise:
Atomic Layer Deposition
Temperature Control
Substrate Processing
Multi-Zone Pedestal
Chemical Deposition
Effluent Build-Up
Electrostatic Chuck
Film Property Modulation
Defect Reduction
Gas Delivery System
Pumping Exhaust System
Interfacial Reactions
58 patents (USPTO):Explore Patents
1. 12624455 - Trim and deposition profile control with multi-zone heated substrate support for multi-patterning processes (2026-05-12),
2. 12531220 - Automated feedforward and feedback sequence for patterning CD control (2026-01-20),
3. 12322617 - Dual zone heaters for metallic pedestals (2025-06-03),
4. 12308264 - Rapid tuning of critical dimension non-uniformity by modulating temperature transients of multi-zone substrate supports (2025-05-20),
5. 12266509 - Multilayer coatings of component parts for a work piece processing chamber (2025-04-01),
6. 12209312 - Temperature control of a multi-zone pedestal (2025-01-28),
7. 12209310 - Concentration control using a bubbler (2025-01-28),
8. 12186851 - Use of vacuum during transfer of substrates (2025-01-07),
9. 12142509 - Electrostatic chuck with seal surface (2024-11-12),
10. 12110586 - Pedestals for modulating film properties in atomic layer deposition (ALD) substrate processing chambers (2024-10-08),
11. 12071689 - Trim and deposition profile control with multi-zone heated substrate support for multi-patterning processes (2024-08-27),
12. 12062554 - Progressive heating of components of substrate processing systems using TCR element-based heaters (2024-08-13),
13. 12049698 - Systems and methods for reducing effluent build-up in a pumping exhaust system (2024-07-30),
14. 11959175 - Fill on demand ampoule refill (2024-04-16),
15. 11959172 - Substrate processing systems including gas delivery system with reduced dead legs (2024-04-16),

Sure, here is the article about inventor Ramesh Chandrasekharan:

Title: Innovator Spotlight: Ramesh Chandrasekharan - Pioneering Solutions for Substrate Processing Systems

Introduction:

Ramesh Chandrasekharan is a prolific inventor based in Portland, Oregon, with a notable track record of 46 patents to his name. His innovative work in the field of substrate processing systems has significantly contributed to advancements in the industry.

Latest Patents:

Chandrasekharan's latest patents showcase his expertise in developing cutting-edge solutions for reducing effluent build-up in pumping exhaust systems and optimizing the use of fill on demand ampoules. These patents demonstrate his commitment to enhancing the efficiency and effectiveness of substrate treatment processes.

Career Highlights:

Throughout his career, Ramesh Chandrasekharan has held key positions at prominent companies such as Lam Research Corporation and Novellus Systems Incorporated. His tenure at these leading organizations has provided him with valuable insights and opportunities to work on groundbreaking projects.

Collaborations:

During his professional journey, Chandrasekharan has collaborated closely with accomplished colleagues such as Adrien Lavoie and Karl Frederick Leeser. Together, they have leveraged their collective expertise to drive innovation and solve complex challenges in the field of substrate processing systems.

Conclusion:

In conclusion, Ramesh Chandrasekharan's contributions to the realm of substrate processing systems have been both significant and enduring. His inventive spirit, coupled with his technical proficiency, has enabled him to make a lasting impact on the industry. We look forward to seeing more groundbreaking inventions from this talented inventor in the future.

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Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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