The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 07, 2025

Filed:

Jun. 16, 2020
Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Ramesh Chandrasekharan, Lake Oswego, OR (US);

Michael Philip Roberts, Tigard, OR (US);

Paul Konkola, West Linn, OR (US);

Michael G. R. Smith, West Linn, OR (US);

Brian Joseph Williams, Tigard, OR (US);

Ravi Kumar, Beaverton, OR (US);

Pulkit Agarwal, Beaverton, OR (US);

Adrien Lavoie, Newberg, OR (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23Q 3/00 (2006.01); B23Q 3/08 (2006.01); B25B 11/00 (2006.01);
U.S. Cl.
CPC ...
B23Q 3/088 (2013.01); B25B 11/005 (2013.01); B23Q 2703/04 (2013.01);
Abstract

A method for evacuating a volume below a substrate in a substrate processing system includes arranging the substrate on a lift mechanism of a substrate support to define the volume below the substrate between the substrate and an upper surface of the substrate support. An evacuation step is initiated to evacuate the volume below the substrate. The evacuation step includes pumping down the volume below the substrate at least one of through and around the lift mechanism. The lift mechanism is lowered during the evacuation step to position the substrate on the upper surface of the substrate support and the evacuation step is terminated.


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