Providence, RI, United States of America

Ravi Kumar

This inventor holds 14 USPTO granted patents and 7 published patent applications, primarily in Atomic Layer Deposition. Top assignees: Lam Research Corporation, Brown University. Active years: 2020-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ravi Kumar. Retrieved from https://idiyas.com/inventor/ravi-kumar-3ciohnxo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 14 (Patent Applications = 7)

% Patents Active = 100.0

Average Co-Inventor Count = 5.3

ph-index = 1

Forward Citations = 5(Granted Patents)

Location History:

Providence, RI (US) (2020 - 2022)
Beaverton, OR (US) (2024)

Company Filing History:

13 out of 3,966

Lam Research Corporation

Years Active: 2020-2026

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Areas of Expertise:

Multi-Zone Substrate Support

Critical Dimension Control

Atomic Layer Deposition

Temperature Control

Patterning Processes

Substrate Processing

Vacuum Transfer

In-Situ Imaging

Film Property Correction

Baffle Design

14 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12624455 - Trim and deposition profile control with multi-zone heated substrate support for multi-patterning processes (2026-05-12),

2. 12531220 - Automated feedforward and feedback sequence for patterning CD control (2026-01-20),

3. 12473633 - Plasma enhanced atomic layer deposition of silicon-containing films (2025-11-18),

4. 12308264 - Rapid tuning of critical dimension non-uniformity by modulating temperature transients of multi-zone substrate supports (2025-05-20),

5. D1073758 - Baffle for substrate processing system (2025-05-06),

6. 12209312 - Temperature control of a multi-zone pedestal (2025-01-28),

7. 12186851 - Use of vacuum during transfer of substrates (2025-01-07),

8. 12071689 - Trim and deposition profile control with multi-zone heated substrate support for multi-patterning processes (2024-08-27),

9. 11322416 - Controller for controlling core critical dimension variation using flash trim sequence (2022-05-03),

10. 11236422 - Multi zone substrate support for ALD film property correction and tunability (2022-02-01),

11. 11078570 - Azimuthal critical dimension non-uniformity for double patterning process (2021-08-03),

12. 10847352 - Compensating chamber and process effects to improve critical dimension variation for trim process (2020-11-24),

13. 10833374 - In-situ x-ray scatter imaging of battery electrodes (2020-11-10),

14. 10727143 - Method for controlling core critical dimension variation using flash trim sequence (2020-07-28),

Title: Innovations of Inventor Ravi Kumar

Introduction

Ravi Kumar is a notable inventor based in Providence, RI (US), recognized for his contributions to substrate processing technology. With a total of 11 patents to his name, he has made significant advancements in the field.

Latest Patents

One of his latest patents is titled "Rapid tuning of critical dimension non-uniformity by modulating temperature transients of multi-zone substrate supports." This innovative substrate processing system includes a processing chamber, a substrate support with multiple heater zones, a gas delivery system for process gases, and a controller that manages the heating process. The controller initiates a treatment step during a transient temperature period, adjusting the heating of each zone based on average heat functions determined during the treatment.

Another patent he holds is for a "Baffle for substrate processing system," which further enhances the efficiency of substrate processing.

Career Highlights

Ravi Kumar has worked with prominent organizations such as Lam Research Corporation and Brown University. His experience in these institutions has allowed him to develop and refine his innovative ideas.

Collaborations

He has collaborated with talented individuals like Pulkit Agarwal and Adrien Lavoie, contributing to the advancement of technology in his field.

Conclusion

Ravi Kumar's work exemplifies the spirit of innovation in substrate processing technology. His patents reflect a commitment to improving efficiency and effectiveness in the industry.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

7 patents pending: