The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 20, 2026

Filed:

May. 04, 2021
Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Ravi Kumar, Beaverton, OR (US);

Pulkit Agarwal, Beaverton, OR (US);

Michael Philip Roberts, Tigard, OR (US);

Ramesh Chandrasekharan, Portland, OR (US);

Adrien Lavoie, Newberg, OR (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/02 (2006.01); H01L 21/033 (2006.01); H01L 21/311 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3299 (2013.01); H01J 37/32724 (2013.01); H01J 37/32926 (2013.01); H01L 21/0228 (2013.01); H01L 21/0337 (2013.01); H01L 21/31116 (2013.01); H01L 21/31144 (2013.01); H01L 22/20 (2013.01); H01J 2237/3321 (2013.01); H01J 2237/3323 (2013.01); H01J 2237/3325 (2013.01); H01J 2237/3341 (2013.01);
Abstract

A method for performing a feedback sequence for patterning CD control. The method including performing a series of process steps on a wafer to obtain a plurality of features, wherein a process step is performed under a process condition. The method including measuring a dimension of the plurality of features after performing the series of process steps. The method including determining a difference between the dimension that is measured and a target dimension for the plurality of features. The method including modifying the process condition for the process step based on the difference and a sensitivity factor for the plurality of features relating change in dimension and change in process condition.


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