The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2025
Filed:
Sep. 23, 2020
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Kapu Sirish Reddy, Portland, OR (US);
Jon Henri, West Linn, OR (US);
Francis Sloan Roberts, Portland, OR (US);
Assignee:
LAM RESEARH CORPORATION, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/26 (2006.01); H01L 21/033 (2006.01); H01L 21/308 (2006.01); H01L 23/29 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3086 (2013.01); C23C 16/26 (2013.01); H01L 21/02274 (2013.01); H01L 21/0335 (2013.01); H01L 21/0337 (2013.01); H01L 23/298 (2013.01);
Abstract
A tool and method for processing substrates by encapsulating a mask to protect from degradation during an etch-back to prevent a feature liner material from pinching off an opening during deposition-etch cycles used to fabricate high aspect ratio features with very tight critical dimension control.