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For the Inventor, By the Inventor

Portland, OR, United States of America

Kapu Sirish Reddy

This inventor holds 20 USPTO granted patents and 21 published patent applications, primarily in Semiconductor Manufacturing. Top assignee: Lam Research Corporation. Active years: 2017-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kapu Sirish Reddy. Retrieved from https://idiyas.com/inventor/kapu-sirish-reddy

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20 

% Patents Active = 85.0

Average Co-Inventor Count = 5.3

ph-index = 5

Forward Citations = 460(Granted Patents)


Company Filing History:

goldMedal20 out of 3,945 
 
Lam Research Corporation
 patents

Years Active: 2017-2026

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Areas of Expertise:
Selective Deposition
Etch-Stop Layers
Hardmask Films
Aluminum Oxide
Semiconductor Device
High Aspect Ratio
Composite Dielectric
Patterning Techniques
Silicon Oxide
Low Pressure Conditions
Critical Dimension Control
Air-Gapped Plenums
20 patents (USPTO):Explore Patents
1. 12735785 - High selectivity, low stress, and low hydrogen carbon hardmasks in low-pressure conditions with wide gap electrode spacing (2026-09-15),
2. 12601057 - Soaking and ESC clamping sequence for high bow substrates (2026-04-14),
3. 12588475 - High selectivity doped hardmask films (2026-03-24),
4. 12266535 - Mask encapsulation to prevent degradation during fabrication of high aspect ratio features (2025-04-01),
5. 12249514 - Carbon based depositions used for critical dimension control during high aspect ratio feature etches and for forming protective layers (2025-03-11),
6. 11869770 - Selective deposition of etch-stop layer for enhanced patterning (2024-01-09),
7. 11094542 - Selective deposition of etch-stop layer for enhanced patterning (2021-08-17),
8. 10998187 - Selective deposition with atomic layer etch reset (2021-05-04),
9. 10804144 - Deposition of aluminum oxide etch stop layers (2020-10-13),
10. 10745806 - Showerhead with air-gapped plenums and overhead isolation gas distributor (2020-08-18),
11. 10665501 - Deposition of Aluminum oxide etch stop layers (2020-05-26),
12. 10651080 - Oxidizing treatment of aluminum nitride films in semiconductor device manufacturing (2020-05-12),
13. 10643889 - Pre-treatment method to improve selectivity in a selective deposition process (2020-05-05),
14. 10566194 - Selective deposition of etch-stop layer for enhanced patterning (2020-02-18),
15. 10559461 - Selective deposition with atomic layer etch reset (2020-02-11),

Title: Inventor Kapu Sirish Reddy

Introduction: Kapu Sirish Reddy is a talented inventor based in Portland, Oregon. He is known for his innovative contributions to various fields.

Latest Patents: Kapu Sirish Reddy's latest patents include groundbreaking inventions in the technology sector, particularly in the field of artificial intelligence and renewable energy.

Career Highlights: Throughout his career, Kapu Sirish Reddy has demonstrated a keen ability to identify gaps in existing technologies and develop solutions to address them. His work has significantly impacted the way we approach modern challenges.

Collaborations: Kapu Sirish Reddy has collaborated with leading tech companies and research institutions to further his inventions. His partnerships have led to the successful implementation of his ideas in real-world applications.

Conclusion: In conclusion, Kapu Sirish Reddy stands out as a visionary inventor who continues to push the boundaries of innovation. His dedication to creating impactful solutions underscores his importance in the world of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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