The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2020
Filed:
Nov. 01, 2019
Lam Research Corporation, Fremont, CA (US);
Nagraj Shankar, Tualatin, OR (US);
Jeffrey D. Womack, Lake Oswego, OR (US);
Meliha Gozde Rainville, Lake Oswego, OR (US);
Emile C. Draper, Molalla, OR (US);
Pankaj G. Ramnani, Tigard, OR (US);
Feng Bi, Cupertino, CA (US);
Pengyi Zhang, Tigard, OR (US);
Elham Mohimi, Hillsboro, OR (US);
Kapu Sirish Reddy, Portland, OR (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
Showerheads for independently delivering different, mutually-reactive process gases to a wafer processing space are provided. The showerheads include a first gas distributor that has multiple plenum structures that are separated from one another by a gap, as well as a second gas distributor positioned above the first gas distributor. Isolation gas from the second gas distributor may be flowed down onto the first gas distributor and through the gaps in between the plenum structures of the first gas distributor, thereby establishing an isolation gas curtain that prevents the process gases released from each plenum structure from parasitically depositing on the plenum structures that provide other gases.