Company Filing History:
Years Active: 2019-2024
Title: Elham Mohimi: A Pioneer in Semiconductor Manufacturing Innovations
Introduction
Elham Mohimi, an accomplished inventor based in Hillsboro, OR, has made significant contributions to the field of semiconductor manufacturing. With a total of six patents to her name, her innovative work has enhanced processes that are crucial for the development of modern technologies.
Latest Patents
One of Elham's most notable patents focuses on the selective deposition of etch-stop layers for enhanced patterning during semiconductor manufacturing. This invention outlines a method that incorporates operations for adding a photo-resist material on top of a base material of a substrate. This innovative approach includes defining a pattern for etching in areas where the photo-resist is absent. Further operations involve conformally capping the substrate with an oxide material post-addition of the photo-resist, along with gap filling the substrate with a specific filling material after the capping. Selective growth of a stop-etch material on exposed surfaces, alongside the removal of materials to enable deeper etching, showcases her expertise in advancing semiconductor processes.
Career Highlights
Elham Mohimi has worked with renowned companies, including Lam Research Corporation, where she has honed her skills in semiconductor manufacturing. Her experience in such a leading organization has equipped her with the knowledge and tools necessary to innovate in her field.
Collaborations
Throughout her career, Elham has collaborated with skilled professionals such as Nagraj Shankar and Kapu Sirish Reddy. These partnerships have allowed her to leverage diverse expertise, further enhancing the impact of her inventions.
Conclusion
Elham Mohimi stands out as a significant inventor in semiconductor manufacturing. Her six patents exemplify her commitment to innovation and her ability to address complex challenges in the industry. As technology continues to evolve, her contributions will undoubtedly pave the way for future advancements in semiconductor processes.
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