Lake Oswego, OR, United States of America

Meliha Gozde Rainville


Average Co-Inventor Count = 5.2

ph-index = 4

Forward Citations = 65(Granted Patents)


Location History:

  • Beaverton, OR (US) (2018 - 2020)
  • Lake Oswego, OR (US) (2019 - 2021)

Company Filing History:


Years Active: 2018-2021

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10 patents (USPTO):Explore Patents

Title: Meliha Gozde Rainville: Innovator in Semiconductor Technology

Introduction

Meliha Gozde Rainville is a prominent inventor based in Lake Oswego, Oregon. She has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. Her innovative work focuses on methods that enhance the efficiency and effectiveness of semiconductor fabrication processes.

Latest Patents

One of her latest patents is titled "Selective deposition with atomic layer etch reset." This patent outlines methods for conducting a deposition on a semiconductor substrate by selectively depositing materials. The process involves managing nucleation delays associated with different substrate materials to optimize deposition outcomes. Another notable patent is "Deposition of aluminum oxide etch stop layers." This invention details the deposition of aluminum oxide films on partially fabricated semiconductor devices, ensuring that underlying metals do not oxidize during the process.

Career Highlights

Meliha Gozde Rainville is currently employed at Lam Research Corporation, a leading company in semiconductor manufacturing equipment. Her work at Lam Research has positioned her as a key player in advancing semiconductor technologies.

Collaborations

Throughout her career, Meliha has collaborated with talented individuals such as Nagraj Shankar and Kapu Sirish Reddy. These collaborations have further enriched her innovative contributions to the field.

Conclusion

Meliha Gozde Rainville is a trailblazer in semiconductor technology, with a strong portfolio of patents that reflect her expertise and innovative spirit. Her work continues to influence the industry and pave the way for future advancements.

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