The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2026
Filed:
Dec. 05, 2022
Lam Research Corporation, Fremont, CA (US);
Feng Bi, Lake Oswego, OR (US);
Kapu Sirish Reddy, Portland, OR (US);
Niraj Rana, West Linn, OR (US);
Ateeq Junaid Suria, Portland, OR (US);
Toshisato Ono, Tualatin, OR (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method for processing a substrate comprises a) delivering a substrate to a pedestal of an electrostatic chuck (ESC) of a processing chamber; b) increasing a pressure in the processing chamber to a first predetermined pressure in a first predetermined pressure range; c) soaking the substrate at the first predetermined pressure for a first predetermined period without clamping the substrate; d) after the first predetermined period, ramping a clamping voltage supplied to the ESC to a first clamping voltage during a second predetermined period; e) after the second predetermined period, increasing the pressure in the processing chamber to a predetermined process pressure greater than the first predetermined pressure; and f) performing a treatment on the substrate at the predetermined process pressure.