This inventor holds 4 USPTO granted patents and 4 published patent applications. Top assignee: Lam Research Corporation. Active years: 2021-2026.
Company Filing History:
Years Active: 2021-2026
Title: Innovations of Inventor Niraj Rana
Introduction
Niraj Rana is an accomplished inventor based in West Linn, Oregon. He has made significant contributions to the field of substrate processing systems, holding a total of 4 patents. His work focuses on enhancing the efficiency and reliability of electrostatic chuck systems used in integrated circuit fabrication.
Latest Patents
One of Niraj's latest patents is titled "Undercoating coverage and resistance control for ESCS of substrate processing systems." This invention involves an electrostatic chuck (ESC) undercoating system that includes a memory and a controller. The memory stores an undercoat application, while the controller is configured to execute this application by determining undercoat parameters and performing a full clean process to remove undercoat deposits in the processing chamber. Based on the undercoat parameters, the controller can also perform one or more deposition processes to deposit undercoat layers on the ESC, providing protection during subsequent substrate processing.
Another notable patent is "Detection and location of anomalous plasma events in fabrication chambers." This apparatus is designed to determine the occurrence of anomalous plasma events at or near a process station within a multi-station integrated circuit fabrication chamber. The invention utilizes optical emissions generated in response to these events, which are detected by a series of photosensors. A processor works in conjunction with these photosensors to confirm the occurrence of the anomalous plasma event.
Career Highlights
Niraj Rana is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His innovative work has contributed to advancements in substrate processing technologies, making significant impacts in the field.
Collaborations
Niraj has collaborated with talented coworkers, including Noah Elliot Baker and Yukinori Sakiyama. Their combined expertise has fostered a productive environment for innovation and development.
Conclusion
Niraj Rana's contributions to the field of substrate processing systems through his patents demonstrate his commitment to innovation and excellence. His work continues to influence the semiconductor industry positively.