The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2025

Filed:

Nov. 18, 2020
Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Yukinori Sakiyama, West Linn, OR (US);

Niraj Rana, West Linn, OR (US);

Noah Elliot Baker, West Linn, OR (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/50 (2006.01); C23C 16/52 (2006.01); G01J 3/02 (2006.01); G01J 3/443 (2006.01); H01J 37/244 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32917 (2013.01); C23C 16/50 (2013.01); C23C 16/52 (2013.01); G01J 3/0248 (2013.01); G01J 3/443 (2013.01); H01J 37/244 (2013.01); H01J 37/32899 (2013.01); H01L 21/6719 (2013.01); H01L 21/67288 (2013.01); H01J 37/32082 (2013.01); H01J 2237/2445 (2013.01);
Abstract

An apparatus to determine occurrence of an anomalous plasma event occurring at or near a process station of a multi-station integrated circuit fabrication chamber is disclosed. In particular embodiments, optical emissions generated responsive to the anomalous plasma event may be detected by at least one photosensor of a plurality of photosensors. A processor may cooperate with the plurality of photosensors to determine that the anomalous plasma event has occurred at or near by a particular process station of the multi-station integrated circuit fabrication chamber.


Find Patent Forward Citations

Loading…