The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2024
Filed:
Oct. 26, 2018
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Michael Rice, Pleasanton, CA (US);
Joseph AuBuchon, San Jose, CA (US);
Sanjeev Baluja, Campbell, CA (US);
Mandyam Sriram, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/68 (2006.01); H01L 21/687 (2006.01); C23C 16/44 (2006.01); C23C 16/458 (2006.01); H01L 21/67 (2006.01); C23C 16/46 (2006.01); H01L 21/683 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68785 (2013.01); C23C 16/4409 (2013.01); C23C 16/4584 (2013.01); C23C 16/45525 (2013.01); C23C 16/46 (2013.01); H01L 21/6719 (2013.01); H01L 21/67103 (2013.01); H01L 21/67248 (2013.01); H01L 21/6831 (2013.01); H01L 21/6833 (2013.01); H01L 21/68764 (2013.01); H01L 21/68771 (2013.01);
Abstract
Apparatus and methods to process one or more wafers are described. A plurality of process stations are arranged in a circular configuration around a rotational axis. A support assembly with a rotatable center base defining a rotational axis, at least two support arms extending from the center base and heaters on each of the support arms is positioned adjacent the processing stations so that the heaters can be moved amongst the various process stations to perform one or more process condition.