The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 05, 2024

Filed:

Feb. 08, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Hari Ponnekanti, San Jose, CA (US);

Tsutomu Tanaka, Santa Clara, CA (US);

Mandyam Sriram, San Jose, CA (US);

Dmitry A. Dzilno, Sunnyvale, CA (US);

Sanjeev Baluja, Campbell, CA (US);

Mario D. Silvetti, Fountain Hills, AZ (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/455 (2006.01); C23C 16/46 (2006.01); H01L 21/02 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32091 (2013.01); C23C 16/45536 (2013.01); C23C 16/45544 (2013.01); C23C 16/46 (2013.01); H01J 37/32568 (2013.01); H01J 37/32715 (2013.01); H01L 21/0262 (2013.01); H01L 21/306 (2013.01);
Abstract

Processing chambers with a plurality of processing stations and individual wafer support surfaces are described. The processing stations and wafer support surfaces are arranged so that there is an equal number of processing stations and heaters. An RF generator is connected to a first electrode in a first station and a second electrode in a second station. A bottom RF path is formed by a connection between a first support surface and a second support surface.


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