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Santa Clara, CA, United States of America

Tsutomu Tanaka

USPTO Granted Patents = 55 (Patent Applications = 8)

Average Co-Inventor Count = 5.4

ph-index = 22

Forward Citations = 3,582(Granted Patents)

Forward Citations (Not Self Cited) = 3,522(Dec 10, 2025)

Location History:

Funabashi, JP (1998)
Sana Clara, CA (US) (2004)
Santa Clara, CA (US) (2000 - 2024)

Company Filing History:

55 out of 13,713

Applied Materials, Inc.

Years Active: 1998-2025

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Areas of Expertise:

Semiconductor Processing

Plasma Source Technology

Atomic Layer Deposition

Chemical Vapor Deposition

Plasma Immersion Ion Implantation

Dielectric Film Deposition

Plasma Cleaning Techniques

Microwave Plasma Sources

Film Stress Modulation

Electrode Design

Process Uniformity

Optical Emission Spectroscopy

55 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12456602 - Semiconductor processing chambers and methods for deposition and etch (2025-10-28),

2. 12288677 - Vertically adjustable plasma source (2025-04-29),

3. 12224156 - Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool (2025-02-11),

4. 12205845 - Semiconductor processing chamber to accommodate parasitic plasma formation (2025-01-21),

5. 12195851 - Thin layer deposition with plasma pulsing (2025-01-14),

6. 12142459 - Single chamber flowable film formation and treatments (2024-11-12),

7. 11923172 - Paired dynamic parallel plate capacitively coupled plasmas (2024-03-05),

8. 11887818 - Methods and systems to modulate film stress (2024-01-30),

9. 11823871 - Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool (2023-11-21),

10. 11776793 - Plasma source with ceramic electrode plate (2023-10-03),

11. 11705312 - Vertically adjustable plasma source (2023-07-18),

12. 11699571 - Semiconductor processing chambers for deposition and etch (2023-07-11),

13. 11315763 - Shaped electrodes for improved plasma exposure from vertical plasma source (2022-04-26),

14. 11282676 - Paired dynamic parallel plate capacitively coupled plasmas (2022-03-22),

15. 11158489 - Methods and systems to modulate film stress (2021-10-26),

Title: Unveiling the Ingenious Innovator: Tsutomu Tanaka

Introduction:

Tsutomu Tanaka, a remarkable inventor hailing from Santa Clara, CA, has graced the world of innovations with his prolific mind. With an impressive portfolio of 49 patents under his belt, Tanaka has significantly contributed to the realm of technology and advancements.

Latest Patents:

Tanaka's latest patents showcase his creativity and mastery in the field of technology. From 'Paired Dynamic Parallel Plate Capacitively Coupled Plasmas' to 'Methods and Systems to Modulate Film Stress,' his inventions reflect a deep understanding of intricate processes and cutting-edge technologies.

Career Highlights:

Currently affiliated with Applied Materials, Inc., Tsutomu Tanaka has found a conducive environment to nurture his inventive spirit. Amidst state-of-the-art facilities and a team of visionaries, Tanaka continues to push the boundaries of innovation in the tech industry.

Collaborations:

In his journey of innovation, Tanaka has worked alongside talented individuals such as Kartik Ramaswamy and Hiroji Hanawa. Collaborations with like-minded professionals have not only enriched Tanaka's projects but have also resulted in groundbreaking inventions that have left a lasting impact on the industry.

Conclusion:

In conclusion, Tsutomu Tanaka stands as a beacon of inspiration for aspiring inventors and tech enthusiasts worldwide. His dedication to pushing the limits of what is possible, coupled with his relentless pursuit of excellence, cements his reputation as a true trailblazer in the realm of patents and innovations.

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