The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2023
Filed:
Nov. 13, 2020
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Robert B. Moore, Bigfork, MT (US);
Jared Ahmad Lee, San Jose, CA (US);
Marc David Shull, Los Gatos, CA (US);
Tsutomu Tanaka, Santa Clara, CA (US);
Alexander V. Garachtchenko, Mountain View, CA (US);
Dmitry A. Dzilno, Sunnyvale, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32541 (2013.01); H01J 37/3244 (2013.01); H01J 37/3255 (2013.01); H01J 2237/0453 (2013.01);
Abstract
A plasma source assembly for use with a substrate processing chamber is described. The assembly includes a ceramic lower plate with a plurality of apertures formed therein. A method of processing a substrate in a substrate processing chamber including the plasma source assembly is also described.