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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11887818 B1

PDFFull Text
Date of Patent:
Jan. 30, 2024

Filed:

Oct. 11, 2021

Methods and systems to modulate film stress

Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Tsutomu Tanaka, Santa Clara, CA (US);

John C. Forster, Mt. View, CA (US);

Ran Liu, Sunnyvale, CA (US);

Kenichi Ohno, Sunnyvale, CA (US);

Ning Li, San Jose, CA (US);

Mihaela Balseanu, Sunnyvale, CA (US);

Keiichi Tanaka, San Jose, CA (US);

Li-Qun Xia, Cupertino, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:

Servilla Whitney LLC

Primary Examiner:

Mounir S Amer

Assistant Examiner:

Alexander Belousov

Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/50 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/34 (2006.01); C23C 16/40 (2006.01); C23C 16/52 (2006.01); C23C 16/505 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32449 (2013.01); C23C 16/345 (2013.01); C23C 16/401 (2013.01); C23C 16/458 (2013.01); C23C 16/4554 (2013.01); C23C 16/4583 (2013.01); C23C 16/45544 (2013.01); C23C 16/45551 (2013.01); C23C 16/50 (2013.01); C23C 16/505 (2013.01); C23C 16/52 (2013.01); H01J 37/3244 (2013.01); H01J 37/32137 (2013.01); H01J 37/32183 (2013.01); H01J 37/32935 (2013.01); H01J 37/32082 (2013.01);
Abstract

Apparatus and methods to control the phase of power sources for plasma process regions in a batch process chamber. A master exciter controls the phase of the power sources during the process sequence based on feedback from the match circuits of the respective plasma sources.

Find Patent Forward Citations

Tanaka, Tsutomu. (2024). Methods and systems to modulate film stress (U.S. Patent No. 11887818). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11887818

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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