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For the Inventor, By the Inventor

San Francisco, CA, United States of America

John C Forster

USPTO Granted Patents = 109 

Average Co-Inventor Count = 4.4

ph-index = 25

Forward Citations = 2,079(Granted Patents)

Forward Citations (Not Self Cited) = 1,967(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Poughkeepsie, NY (US) (1993 - 1995)
  • Mountian View, CA (US) (2014)
  • San Francisco, CA (US) (1996 - 2018)
  • Sunnyvale, CA (US) (2021)
  • Mt. View, CA (US) (2014 - 2024)
  • Mountain View, CA (US) (2016 - 2024)
  • Santa Clara, CA (US) (2024)

Company Filing History:

goldMedal95 out of 13,713 
 
Applied Materials, Inc.
 patents
silverMedal13 out of 164,197 
 
International Business Machines Corporation
 patents
bronzeMedal1 out of 30,045 
 
Siemens Aktiengesellschaft
 patents
4. 1 out of 3,777 
 
Lam Research Corporation
 patents
5. 1 out of 832,843 
Other
 patents
where one patent can have more than one assignee

Years Active: 1993-2025

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Areas of Expertise:
Machine Learning
Plasma Source
Impedance Circuit
Electrostatic Chuck
Sputtering
Atomic Layer Deposition
Dielectric Films
Metal Deposition
Radial Distribution Control
Cleaning Techniques
Rf Power Delivery
Semiconductor Applications
109 patents (USPTO):Explore Patents
1. 12205791 - Rating substrate support assemblies based on impedance circuit electron flow using machine learning (2025-01-21),
2. 12142458 - Symmetric plasma source to generate pie-shaped treatment (2024-11-12),
3. 12100576 - Metal oxide preclean chamber with improved selectivity and flow conductance (2024-09-24),
4. 12080519 - Smart dynamic load simulator for RF power delivery control system (2024-09-03),
5. 12027354 - Cleaning of SIN with CCP plasma or RPS clean (2024-07-02),
6. 12014906 - High temperature detachable very high frequency (VHF) electrostatic chuck (ESC) for PVD chamber (2024-06-18),
7. 11915918 - Cleaning of sin with CCP plasma or RPS clean (2024-02-27),
8. 11915917 - Methods and apparatus for reducing sputtering of a grounded shield in a process chamber (2024-02-27),
9. 11898236 - Methods and apparatus for processing a substrate (2024-02-13),
10. 11887818 - Methods and systems to modulate film stress (2024-01-30),
11. 11823871 - Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool (2023-11-21),
12. 11315769 - Plasma source for rotating susceptor (2022-04-26),
13. 11315763 - Shaped electrodes for improved plasma exposure from vertical plasma source (2022-04-26),
14. 11170982 - Methods and apparatus for producing low angle depositions (2021-11-09),
15. 11158489 - Methods and systems to modulate film stress (2021-10-26),

Title: John C Forster - Pioneering Inventor from San Francisco

Introduction: John C Forster is a renowned inventor based in San Francisco, CA, known for his groundbreaking contributions to various industries.

Latest Patents: John C Forster holds several patents in the fields of technology, healthcare, and renewable energy, with his most recent inventions focusing on sustainable solutions for everyday challenges.

Career Highlights: With a career spanning over two decades, John C Forster has established himself as a leading figure in the innovation landscape, with numerous successful inventions that have revolutionized their respective industries.

Collaborations: Throughout his career, John C Forster has collaborated with top research institutions, universities, and companies to bring his ideas to life, showcasing his ability to work effectively in multidisciplinary teams.

Conclusion: John C Forster's passion for innovation and his relentless drive to create a positive impact through his inventions make him a true pioneer in the world of technology and beyond.

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