The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2024

Filed:

Jun. 15, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Alan Ritchie, Pleasanton, CA (US);

John C. Forster, Mountain View, CA (US);

Muhammad Rasheed, San Jose, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); H01J 37/32 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3441 (2013.01); C23C 14/34 (2013.01); H01J 37/32504 (2013.01); H01J 37/32651 (2013.01); H01J 37/3405 (2013.01); H01J 37/3411 (2013.01);
Abstract

Methods and apparatus for physical vapor deposition are provided herein. In some embodiments, a process kit shield for use in a physical vapor deposition chamber may include an electrically conductive body having one or more sidewalls defining a central opening, wherein the body has a ratio of a surface area of inner facing surfaces of the one or more sidewalls to a height of the one or more sidewalls of about 2 to about 3.


Find Patent Forward Citations

Ritchie, Alan. (2024). Methods and apparatus for reducing sputtering of a grounded shield in a process chamber (U.S. Patent No. 11915917). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11915917

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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