The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2024
Filed:
Jul. 11, 2022
Applied Materials, Inc., Santa Clara, CA (US);
Jothilingam Ramalingam, Sunnyvale, CA (US);
Yong Cao, San Jose, CA (US);
Ilya Lavitsky, San Francisco, CA (US);
Keith A. Miller, Mountain View, CA (US);
Tza-Jing Gung, San Jose, CA (US);
Xianmin Tang, San Jose, CA (US);
Shane Lavan, Jan Jose, CA (US);
Randy D Schmieding, Los Gatos, CA (US);
John C. Forster, Mt. View, CA (US);
Kirankumar Neelasandra Savandaiah, Karnataka, IN;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A physical vapor deposition processing chamber is described. The processing chamber includes a target backing plate in a top portion of the processing chamber, a substrate support in a bottom portion of the processing chamber, a deposition ring positioned at an outer periphery of the substrate support and a shield. The substrate support has a support surface spaced a distance from the target backing plate to form a process cavity. The shield forms an outer bound of the process cavity. In-chamber cleaning methods are also described. In an embodiment, the method includes closing a bottom gas flow path of a processing chamber to a process cavity, flowing an inert gas from the bottom gas flow path, flowing a reactant into the process cavity through an opening in the shield, and evacuating the reaction gas from the process cavity.