Sunnyvale, CA, United States of America

Jothilingam Ramalingam

USPTO Granted Patents = 21 

Average Co-Inventor Count = 4.6

ph-index = 2

Forward Citations = 14(Granted Patents)


Location History:

  • Sunnyvale, CA (US) (2016 - 2024)
  • Milpitas, CA (US) (2022 - 2024)

Company Filing History:


Years Active: 2016-2025

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21 patents (USPTO):

Title: Innovations and Contributions of Jothilingam Ramalingam

Introduction

Jothilingam Ramalingam is a prolific inventor based in Sunnyvale, California. With an impressive portfolio of 20 patents, he has made significant contributions to the field of materials engineering and deposition methods.

Latest Patents

One of his latest patents is titled "Method and Chamber for Backside Physical Vapor Deposition." This invention focuses on techniques for backside stress engineering of substrates to alleviate film stresses and bowing issues. The method involves flipping a substrate at a factory interface to face the backside upwards and then transferring it to a physical vapor deposition chamber for film layer deposition. Additionally, the apparatus for this process features a substrate supporting surface designed to support the substrate at or near its periphery, ensuring that the front side’s active region remains unaffected during the deposition process.

Career Highlights

Jothilingam Ramalingam has been associated with Applied Materials, Inc., a leading company in the field of materials engineering. His role involves pioneering research and development that advances manufacturing technologies.

Collaborations

Throughout his career, Jothilingam has collaborated with notable professionals, including Jianxin Lei and Yong Cao. Their joint efforts in research continue to push the boundaries of innovations in substrate processing techniques and materials science.

Conclusion

In conclusion, Jothilingam Ramalingam stands out as a remarkable inventor whose innovative approaches to physical vapor deposition have enhanced the materials engineering field. His contributions not only reflect his expertise but also demonstrate the collaborative spirit within the industry, elevating the standards of research and technological advancement.

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