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For the Inventor, By the Inventor

Santa Clara, CA, United States of America

Shane Lavan

USPTO Granted Patents = 15 

Average Co-Inventor Count = 6.5

ph-index = 2

Forward Citations = 9(Granted Patents)


Location History:

  • Santa Clara, CA (US) (2022 - 2023)
  • Palo Alto, CA (US) (2022 - 2024)
  • Jan Jose, CA (US) (2024)

Company Filing History:

goldMedal15 out of 13,684 
 
Applied Materials, Inc.
 patents

Years Active: 2022-2025

where 'Filed Patents' based on already Granted Patents

15 patents (USPTO):
1. D1072774 - Target profile for a physical vapor deposition chamber target (2025-04-29),
2. 12185643 - High critical temperature metal nitride layer with oxide or oxynitride seed layer (2024-12-31),
3. 12183560 - Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process (2024-12-31),
4. 12176205 - Method and chamber for backside physical vapor deposition (2024-12-24),
5. 12142478 - Method and chamber for backside physical vapor deposition (2024-11-12),
6. 12096701 - Method of making high critical temperature metal nitride layer (2024-09-17),
7. 12052935 - Method of making high critical temperature metal nitride layer (2024-07-30),
8. 12027354 - Cleaning of SIN with CCP plasma or RPS clean (2024-07-02),
9. 11915918 - Cleaning of sin with CCP plasma or RPS clean (2024-02-27),
10. 11678589 - Method of making high critical temperature metal nitride layer (2023-06-13),
11. 11600761 - High critical temperature metal nitride layer with oxide or oxynitride seed layer (2023-03-07),
12. 11600477 - Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process (2023-03-07),
13. 11572618 - Method and chamber for backside physical vapor deposition (2023-02-07),
14. 11469096 - Method and chamber for backside physical vapor deposition (2022-10-11),
15. 11450514 - Methods of reducing particles in a physical vapor deposition (PVD) chamber (2022-09-20),

Title: Innovations of Shane Lavan

Introduction

Shane Lavan is a prominent inventor based in Santa Clara, CA, known for his significant contributions to the field of physical vapor deposition (PVD) technology. With a total of 15 patents to his name, Lavan has made remarkable advancements that enhance the efficiency and effectiveness of PVD processes.

Latest Patents

Among his latest patents are several innovative designs and processes. One notable patent is the "Target profile for a physical vapor deposition chamber target," which aims to optimize the performance of PVD systems. Another significant invention is the "Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process." Additionally, he has developed embodiments of a process shield for use in process chambers, which includes an annular body with a unique design featuring multiple annular trenches and slots for improved fluid coupling.

Career Highlights

Shane Lavan has built a successful career at Applied Materials, Inc., where he has been instrumental in driving innovation in PVD technology. His work has not only contributed to the company's success but has also advanced the industry as a whole.

Collaborations

Lavan collaborates with talented individuals such as Yong Cao and Jothilingam Ramalingam, who contribute to the innovative environment at Applied Materials, Inc. Their teamwork fosters creativity and leads to groundbreaking advancements in technology.

Conclusion

Shane Lavan's contributions to the field of physical vapor deposition are noteworthy, with a strong portfolio of patents that reflect his innovative spirit. His work continues to influence the industry and pave the way for future advancements.

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