The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2024
Filed:
Dec. 29, 2020
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Anantha K. Subramani, San Jose, CA (US);
Farzad Houshmand, Santa Clara, CA (US);
Philip A. Kraus, San Jose, CA (US);
Abhishek Chowdhury, Bangalore, IN;
John C. Forster, Mt. View, CA (US);
Kallol Bera, Fremont, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/455 (2006.01); C23C 16/50 (2006.01); H01L 21/67 (2006.01); H05H 1/24 (2006.01); H01L 21/3065 (2006.01); H01L 21/311 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32091 (2013.01); C23C 16/45525 (2013.01); C23C 16/50 (2013.01); H01J 37/32082 (2013.01); H01J 37/32174 (2013.01); H01J 37/3244 (2013.01); H01J 37/32532 (2013.01); H01J 37/32577 (2013.01); H01L 21/67069 (2013.01); H05H 1/4697 (2021.05); H01J 2237/334 (2013.01); H01L 21/3065 (2013.01); H01L 21/31116 (2013.01); H01L 21/31138 (2013.01); H01L 21/32136 (2013.01); H05H 2245/40 (2021.05);
Abstract
Plasma source assemblies comprising a housing with an RF hot electrode having a body and a plurality of source electrodes extending vertically from the RF hot electrode toward the opening in a front face of the housing are described. Processing chambers incorporating the plasma source assemblies and methods of using the plasma source assemblies are also described.