The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 2025

Filed:

Jan. 26, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Arvind Shankar Raman, Corvallis, CA (US);

Harikrishnan Rajagopal, Santa Clara, OR (US);

John Forster, Mountain View, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/244 (2006.01); G01R 21/133 (2006.01); G01R 27/26 (2006.01); G06N 20/00 (2019.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01); H01L 21/683 (2006.01); H04Q 9/00 (2006.01);
U.S. Cl.
CPC ...
H01J 37/244 (2013.01); G01R 21/133 (2013.01); G01R 27/2617 (2013.01); G06N 20/00 (2019.01); H01J 37/32091 (2013.01); H01J 37/32174 (2013.01); H01J 37/32715 (2013.01); H01L 21/67069 (2013.01); H01L 21/67103 (2013.01); H01L 21/6831 (2013.01); H04Q 9/00 (2013.01); H01J 2237/2007 (2013.01); H01J 2237/24564 (2013.01); H01J 2237/334 (2013.01); H04Q 2209/43 (2013.01); H04Q 2209/823 (2013.01);
Abstract

Methods and systems for rating a current substrate support assembly based on impedance circuit electron flow are provided. Data associated with an amount of radio frequency (RF) power flowed through an electrical component of a current substrate support assembly during a current testing process performed for the current substrate support assembly is provided as input to a trained machine learning model. One or more outputs of the trained machine learning model are obtained. A measurement value for an electron flow across an impedance circuit of the current substrate support assembly is extracted from the one or more outputs. In response to a determination that the extracted measurement value for the electron flow satisfies an electron flow criterion, a first quality rating is assigned to the current substrate support assembly.


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