Chandler, AZ, United States of America

Eric J Strang

This inventor holds 62 USPTO granted patents and 1 published patent application and 2 EPO patents, primarily in Semiconductor Processing (CPC class H01L). Top assignees: Tokyo Electron Limited, International Business Machines Corporation. Active years: 2003-2023.

USPTO Granted Patents = 62 

% Patents Active = 35.5

 

Average Co-Inventor Count = 1.7

ph-index = 18

Forward Citations = 2,825(Granted Patents)

Forward Citations (Not Self Cited) = 2,765(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Chandler, AZ (US) (2003 - 2015)
  • Gilbert, AZ (US) (2014 - 2015)
  • Driftwood, TX (US) (2015 - 2023)

Company Filing History:


Years Active: 2003-2023

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Areas of Expertise:
Dry Non-Plasma Treatment
Chemical Vapor Deposition
Atomic Layer Deposition
Temperature Control
Gas Injection
Semiconductor Manufacturing
Radical Distribution
First-Principles Simulation
Substrate Holder Assembly
Wall Film Monitoring
Plasma Processing
Electron Density Measurement
62 patents (USPTO):Explore Patents

Title: Innovations and Achievements of Eric J Strang

Introduction

Eric J Strang is a prolific inventor based in Chandler, AZ, with an impressive portfolio of 62 patents. His work primarily focuses on advanced treatment systems and methods for enhancing substrate qualities, contributing significantly to the field of material processing and chemical vapor deposition.

Latest Patents

Among his latest innovations, the "Dry Non-Plasma Treatment System" stands out. This groundbreaking system is designed for the controlled chemical treatment of various substrates, using gaseous chemistry under specific conditions of surface temperature and gas pressure. Furthermore, this system includes a thermal treatment process to remove chemically altered surfaces from the substrates.

Another notable patent is the "Method for Chemical Vapor Deposition Control." This method details a sophisticated approach for depositing thin films onto substrates within a controlled deposition system. It incorporates a gas heating device with multiple heating element zones, each managed independently, along with a substrate holder equipped with temperature control zones. This method enhances the precision of formulating thin films, further advancing the technological capabilities in material sciences.

Career Highlights

Throughout his career, Eric J Strang has contributed to leading companies, including Tokyo Electron Limited and IBM. His extensive experience in these prominent organizations has enriched his understanding and expertise in patent development and innovation.

Collaborations

Strang has collaborated with distinguished professionals such as Andrej Mitrovic and Wayne L Johnson. These partnerships have facilitated the exchange of ideas and fostered continued advancements in their respective fields.

Conclusion

Eric J Strang's dedication to innovation and his noteworthy patent contributions highlight his critical role in advancing technology relating to material treatments and processes. His work continues to influence various industries, paving the way for future breakthroughs.

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