The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2014
Filed:
Feb. 26, 2002
Applicant:
Eric J. Strang, Chandler, AZ (US);
Inventor:
Eric J. Strang, Chandler, AZ (US);
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/00 (2006.01); C23C 16/50 (2006.01); C23C 16/52 (2006.01); C23C 16/455 (2006.01); C23C 16/509 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45565 (2013.01); C23C 16/455 (2013.01); C23C 16/45557 (2013.01); C23C 16/5096 (2013.01); H01J 37/3244 (2013.01);
Abstract
A plasma-processing chamber including pulsed gas injection orifices/nozzles utilized in combination with continuous flow shower head injection orifices is described. The continuous flow shower head injection orifices introduce a continuous flow of gas while the pulsed gas injection orifices/nozzles cyclically inject a high-pressure gas into the chamber. In one embodiment, a central computer may monitor and control pressure measurement devices and utilize the measurements to adjust processing parameters (e.g. pulse duration, pulse repetition rate, and the pulse mass flow rate of processing gases).