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Tokyo Electron Limited

USPTO Granted Patents = 10,918

% Expired Patents = 21.0

EPO Patents = 240

Trademarks = 69

Forward Citations = 155,475

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5,471 inventors (with patents filed for the assignee):

Chishio Koshimizu (162 out of 170 patents)

Anton J deVilliers (162 out of 217 patents)

H Jim Fulford (123 out of 418 patents)

4. Mark I Gardner (119 out of 636 patents)

5. Alok Ranjan (118 out of 118 patents)

6. Masanobu Honda (108 out of 109 patents)

7. Merritt Funk (106 out of 107 patents)

8. Jeffrey Smith (106 out of 107 patents)

9. Masami Akimoto (104 out of 105 patents)

10. Hitoshi Kato (103 out of 227 patents)

11. Kandabara N Tapily (99 out of 102 patents)

12. Kousuke Yoshihara (95 out of 95 patents)

13. Tsuyoshi Moriya (91 out of 102 patents)

14. Kazuhide Hasebe (90 out of 92 patents)

15. Robert Daniel Clark (89 out of 97 patents)

Core Competencies:

Plasma Processing Apparatus

Substrate Processing Method

Atomic Layer Deposition

Semiconductor Manufacturing

Film Forming Apparatus

Wafer Bonding

Etching Method

Selective Deposition

Metrology Integration

Gas Processing

3D Memory Stacking

Temperature Control

10,918 patents: Sort by Forward Citations

1. D1154736 - Coating and developing apparatus (2026-10-20),

2. 12772811 - Silicidation process for semiconductor devices (2026-10-20),

3. 12772762 - Substrate processing method and substrate processing apparatus (2026-10-20),

4. 12772529 - Method for semiconductor manufacturing (2026-10-20),

5. 12772527 - Film forming method, method of manufacturing semiconductor device, and film forming apparatus (2026-10-20),

6. 12772496 - 3D field effect transistor (FET) device having u-shaped channel structure (2026-10-20),

7. 12770845 - Temperature control system and plasma processing system (2026-10-20),

8. 12770826 - Plasma control method, plasma processing apparatus and plasma processing system (2026-10-20),

9. 12770825 - Plasma processing apparatus (2026-10-20),

10. 12769902 - Information processing apparatus, simulation method, and information processing system (2026-10-20),

11. 12768799 - Testing apparatus and testing method (2026-10-20),

12. 12768046 - Substrate support, apparatus for processing substrate, and method of adjusting temperature of substrate (2026-10-20),

13. 12766739 - Processing system (2026-10-20),

14. 12766434 - Solvent vapor supply apparatus and solvent vapor supply method (2026-10-20),

15. 12765323 - Processing apparatus and processing method (2026-10-13),

Company Overview

Tokyo Electron Limited is a leading provider of semiconductor manufacturing equipment, specializing in advanced plasma processing technologies. The company focuses on a range of core technology topics, including plasma processing apparatus, atomic layer deposition, and etching methods, which are essential for the fabrication of integrated circuits. With a strong emphasis on innovation, Tokyo Electron plays a pivotal role in enhancing substrate processing methods and developing film forming apparatus, contributing significantly to the semiconductor industry's evolution.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

10,918 Patents

#12 in Tokyo

#25 in Japan

#76 in the World

Tokyo Electron Limited

Forward Citations = 155,475

5,471 inventors:

Chishio Koshimizu (162 out of 170 patents)

Anton J deVilliers (162 out of 217 patents)

H Jim Fulford (123 out of 418 patents)

4. Mark I Gardner (119 out of 636 patents)

5. Alok Ranjan (118 out of 118 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Tokyo Electron Limited. Retrieved from https://idiyas.com/company/tokyo-electron

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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