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Tokyo Electron Limited

USPTO Granted Patents = 10,850

% Expired Patents = 21.1

EPO Patents = 240

Trademarks = 69

Forward Citations = 155,475

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5,442 inventors (with patents filed for the assignee):

Chishio Koshimizu (162 out of 170 patents)

Anton J deVilliers (162 out of 217 patents)

H Jim Fulford (121 out of 416 patents)

4. Alok Ranjan (118 out of 118 patents)

5. Mark I Gardner (117 out of 634 patents)

6. Masanobu Honda (108 out of 109 patents)

7. Merritt Funk (106 out of 107 patents)

8. Jeffrey Smith (105 out of 106 patents)

9. Masami Akimoto (104 out of 105 patents)

10. Hitoshi Kato (102 out of 226 patents)

11. Kandabara N Tapily (98 out of 101 patents)

12. Kousuke Yoshihara (95 out of 95 patents)

13. Tsuyoshi Moriya (91 out of 102 patents)

14. Kazuhide Hasebe (90 out of 92 patents)

15. Lee Chen (88 out of 110 patents)

Core Competencies:

Plasma Processing Apparatus

Substrate Processing Method

Atomic Layer Deposition

Semiconductor Manufacturing

Film Forming Apparatus

Wafer Bonding

Etching Method

Selective Deposition

Metrology Integration

Gas Processing

3D Memory Stacking

Temperature Control

10,850 patents: Sort by Forward Citations

1. 12745612 - Methods and structures for improving etch profile of underlying layers (2026-09-22),

2. 12745595 - Method of measuring positional deviation of substrate stage and substrate processing apparatus (2026-09-22),

3. 12745590 - Substrate processing apparatus and substrate processing method (2026-09-22),

4. 12745589 - Information processing system, power adjustment method, and heat treatment apparatus (2026-09-22),

5. 12745588 - Processing method and processing system (2026-09-22),

6. 12745585 - Wafer cleaning method and system using heated functional plate (2026-09-22),

7. 12745402 - Nanosheet 3D transistor for advanced memory elements (2026-09-22),

8. 12744190 - Plasma processing apparatus and gas supply method (2026-09-22),

9. 12744187 - Plasma processing apparatus (2026-09-22),

10. 12744186 - Plasma processing apparatus and plasma processing method (2026-09-22),

11. 12743769 - Shape characteristic value estimation apparatus, shape characteristic value estimation method, and storage medium (2026-09-22),

12. 12743075 - Information collection device for substrate processing apparatus (2026-09-22),

13. 12743033 - Solution treatment apparatus and cleaning method (2026-09-22),

14. 12740368 - Wafer support for measuring wafer geometry (2026-09-15),

15. 12740362 - Substrate processing apparatus and substrate processing method (2026-09-15),

Tokyo Electron Limited is a leading global supplier of semiconductor and flat panel display production equipment. The company offers a wide range of innovative products and solutions for the electronics industry, including wafer processing systems, coaters/developers, thermal processing systems, and more. Tokyo Electron is committed to driving technological advancements and enabling its customers to meet the demands of the ever-evolving semiconductor market.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Sep 22 2026

Tokyo Electron Limited

10,850 Patents

#12 in Tokyo

#25 in Japan

#76 in the World

Tokyo Electron Limited

Forward Citations = 155,475

5,442 inventors:

Chishio Koshimizu (162 out of 170 patents)

Anton J deVilliers (162 out of 217 patents)

H Jim Fulford (121 out of 416 patents)

4. Alok Ranjan (118 out of 118 patents)

5. Mark I Gardner (117 out of 634 patents)

Please report any incorrect information to [email protected]

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