For the Inventor, By the Inventor

Enter assignee name

Tokyo Electron Limited

USPTO Granted Patents = 10,307

EPO Patents = 241

Trademarks = 87

Forward Citations = 150,445

Loading Chart...

Loading Chart...

5,475 inventors (with patents filed for the assignee):

Chishio Koshimizu (155 out of 163 patents)

Anton J deVillers (145 out of 200 patents)

Alok Ranjan (116 out of 116 patents)

4. H Jim Fulford (103 out of 398 patents)

5. Merritt Funk (102 out of 104 patents)

6. Masami Akimoto (102 out of 103 patents)

7. Hitoshi Kato (101 out of 225 patents)

8. Masanobu Honda (101 out of 102 patents)

9. Mark I Gardner (99 out of 616 patents)

10. Jeffrey Smith (95 out of 96 patents)

11. Kousuke Yoshihara (95 out of 95 patents)

12. Kazuhide Hasebe (90 out of 92 patents)

13. Tsuyoshi Moriya (88 out of 100 patents)

14. Lee Chen (87 out of 109 patents)

15. Kandabara N Tapily (87 out of 90 patents)

Core Competencies:

Film Forming Apparatus

Plasma Processing Apparatus

Substrate Processing Method

Sputtering Apparatus

Wafer Bath Imaging

Virtual Metrology

Thermal Etching

Electrostatic Chuck

Patterning Features

Cleaning Method

Gas Shower Head

Substrate Inspection

10,307 patents: Sort by Forward Citations

1. 12495604 - High performance 3D compact transistor architecture (2025-12-09),

2. 12494390 - Substrate processing apparatus, substrate processing method and storage medium (2025-12-09),

3. 12494383 - Gas supply device and semiconductor manufacturing apparatus (2025-12-09),

4. 12494375 - Method to selectively etch silicon nitride to silicon oxide using surface alkylation (2025-12-09),

5. 12494369 - Extreme ultraviolet lithography patterning method (2025-12-09),

6. 12494362 - Atomic layer deposition of aluminum oxide films for semiconductor devices using an aluminum alkoxide oxidizer (2025-12-09),

7. 12494354 - Substrate processing system, information processing apparatus, and information processing method for dynamic control of substrate plasma processing (2025-12-09),

8. 12494351 - Plasma processing apparatus, method for manufacturing upper electrode assembly, and method for reproducing upper electrode assembly (2025-12-09),

9. 12494349 - Member, manufacturing method of member and substrate processing apparatus (2025-12-09),

10. 12494344 - Antenna for inductively coupled plasma excitation, antenna unit for inductively coupled plasma excitation, and plasma processing apparatus (2025-12-09),

11. 12491602 - Substrate processing apparatus, polishing pad inspecting device, and method for inspecting polishing pad (2025-12-09),

12. 12491600 - Substrate warpage correction method, computer storage medium, and substrate warpage correction apparatus (2025-12-09),

13. 12488991 - Substrate processing method and substrate processing apparatus (2025-12-02),

14. 12488990 - Etching method and plasma processing apparatus (2025-12-02),

15. 12488989 - Method to form narrow slot contacts (2025-12-02),

Tokyo Electron Limited is a leading global supplier of semiconductor and flat panel display production equipment. The company offers a wide range of innovative products and solutions for the electronics industry, including wafer processing systems, coaters/developers, thermal processing systems, and more. Tokyo Electron is committed to driving technological advancements and enabling its customers to meet the demands of the ever-evolving semiconductor market.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 9 2025

10,307 Patents

#14 in Tokyo

#25 in Japan

#78 in the World

Tokyo Electron Limited

Forward Citations = 150,445

5,475 inventors:

Chishio Koshimizu (155 out of 163 patents)

Anton J deVillers (145 out of 200 patents)

Alok Ranjan (116 out of 116 patents)

4. H Jim Fulford (103 out of 398 patents)

5. Merritt Funk (102 out of 104 patents)

Please report any incorrect information to support@idiyas.com

Loading…