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Tokyo Electron Limited

USPTO Granted Patents = 10,346

EPO Patents = 239

Trademarks = 84

Forward Citations = 151,118

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5,227 inventors (with patents filed for the assignee):

Chishio Koshimizu (155 out of 163 patents)

Anton J deVillers (145 out of 200 patents)

Alok Ranjan (117 out of 117 patents)

4. H Jim Fulford (106 out of 401 patents)

5. Merritt Funk (102 out of 104 patents)

6. Mark I Gardner (102 out of 619 patents)

7. Masami Akimoto (102 out of 103 patents)

8. Hitoshi Kato (101 out of 225 patents)

9. Masanobu Honda (101 out of 102 patents)

10. Jeffrey Smith (95 out of 96 patents)

11. Kousuke Yoshihara (95 out of 95 patents)

12. Kazuhide Hasebe (90 out of 92 patents)

13. Tsuyoshi Moriya (88 out of 100 patents)

14. Lee Chen (87 out of 109 patents)

15. Kandabara N Tapily (87 out of 90 patents)

Core Competencies:

Film Forming Apparatus

Plasma Processing Apparatus

Substrate Processing Method

Sputtering Apparatus

Wafer Bath Imaging

Virtual Metrology

Thermal Etching

Electrostatic Chuck

Patterning Features

Cleaning Method

Gas Shower Head

Substrate Inspection

10,346 patents: Sort by Forward Citations

1. 12518965 - Film forming method and film forming apparatus (2026-01-06),

2. 12518947 - Plasma processing apparatus and plasma processing coil (2026-01-06),

3. 12516412 - Method for estimating remaining amount of solid raw material, method for forming film, device for feeding raw material gas, and device for forming film (2026-01-06),

4. 12516242 - Substrate processing apparatus and substrate processing method (2026-01-06),

5. 12515243 - Substrate processing apparatus and substrate processing method (2026-01-06),

6. 12513983 - 3D isolation of a segmentated 3D nanosheet channel region (2025-12-30),

7. 12512356 - Apparatus and method for wafer alignment (2025-12-30),

8. 12512354 - Substrate processing apparatus and substrate processing method (2025-12-30),

9. 12512345 - Temperature control device, temperature control method, and inspection apparatus (2025-12-30),

10. 12512344 - Apparatus for transferring member to be disposed in substrate processing chamber, substrate processing system, and method for transferring member (2025-12-30),

11. 12512339 - Temperature control device and substrate processing apparatus (2025-12-30),

12. 12512336 - Substrate processing method and substrate processing apparatus (2025-12-30),

13. 12512330 - Substrate processing method and plasma processing apparatus (2025-12-30),

14. 12512329 - Multi level contact etch (2025-12-30),

15. 12512327 - Surface modification to achieve selective isotropic etch (2025-12-30),

Tokyo Electron Limited is a leading global supplier of semiconductor and flat panel display production equipment. The company offers a wide range of innovative products and solutions for the electronics industry, including wafer processing systems, coaters/developers, thermal processing systems, and more. Tokyo Electron is committed to driving technological advancements and enabling its customers to meet the demands of the ever-evolving semiconductor market.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Jan 6 2026

10,346 Patents

#14 in Tokyo

#25 in Japan

#78 in the World

Tokyo Electron Limited

Forward Citations = 151,118

5,227 inventors:

Chishio Koshimizu (155 out of 163 patents)

Anton J deVillers (145 out of 200 patents)

Alok Ranjan (117 out of 117 patents)

4. H Jim Fulford (106 out of 401 patents)

5. Merritt Funk (102 out of 104 patents)

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