Tsuyoshi Moriya

Nirasaki, Japan

Tsuyoshi Moriya

This inventor holds 102 USPTO granted patents and 19 published patent applications, primarily in Plasma Processing (CPC class H01J37-3244). Top assignees: Tokyo Electron Limited, Nec Corporation, Shimadzu Corporation. Active years: 2000-2026.

USPTO Granted Patents = 102 

% Patents Active = 52.9

Average Co-Inventor Count = 2.5

ph-index = 11

Forward Citations = 552(Granted Patents)

Forward Citations (Not Self Cited) = 509(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Nirasaki-shi, JP (2010)
  • Nirasaka, JP (2012)
  • Minato-ku, JP (2016)
  • Tokyo, JP (2000 - 2024)
  • Nirasaki, JP (2007 - 2024)
  • Yamanashi, JP (2011 - 2024)

Company Filing History:


Years Active: 2000-2026

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Areas of Expertise:
Plasma Processing Device
Film Forming Method
Semiconductor Production
Contaminant Detection
Etching Method
Substrate Cleaning
Vacuum Apparatus
Particle Monitoring
Gas Purification
Polishing Method
Turbomolecular Pump
Cleaning Method
102 patents (USPTO):Explore Patents

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Title: Tsuyoshi Moriya: Pioneering Innovations in Contaminant Detection and Semiconductor Manufacturing.

Introduction: Tsuyoshi Moriya, a distinguished inventor hailing from Nirasaki, Japan, has carved out a remarkable path in the realm of technology with his relentless pursuit of innovation and dedication to creating meaningful change. With an impressive portfolio of 94 patents, Moriya's work continues to inspire and shape the future of technology.

Latest Patents:

1. **Contaminant Detection System:** Moriya's groundbreaking contaminant detection system includes a sophisticated setup with a light source emitting excitation light on the object to be inspected, a detector to pick up fluorescence from contaminants, and a processor for determining the location and type of the contaminant. This system marks a significant advancement in quality control processes.

2. **Etching Method:** Another key innovation by Moriya is an advanced etching method involving a modification process and a removal process. By utilizing fluorine-containing gas and ammonia-based plasma, Moriya's method efficiently removes modification layers from silicon oxide films, enhancing semiconductor manufacturing processes.

Career Highlights: Throughout his career, Tsuyoshi Moriya has contributed significantly to the innovation landscape through his work at renowned companies such as Tokyo Electron Limited and NEC Corporation. His expertise and inventive spirit have propelled these organizations to new heights in technological advancements.

Collaborations: Moriya's impactful work has been further enriched by collaborations with esteemed colleagues such as Hiroyuki Nakayama and Hiroshi Nagaike. Together, they have pushed the boundaries of innovation, paving the way for groundbreaking solutions in the tech industry.

Conclusion: Tsuyoshi Moriya's innovative prowess and unwavering commitment to advancing technology make him a standout figure in the world of inventors. His recent patents in contaminant detection and semiconductor manufacturing underscore his profound impact on the industry, setting a high bar for future innovations. Moriya's legacy serves as a beacon of inspiration for aspiring inventors and underscores the transformative power of dedication and ingenuity in driving meaningful change in the world of technology.

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