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Tokyo Electron Limi Ted

USPTO Granted Patents = 101

Forward Citations = 753

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276 inventors (with patents filed for the assignee):

Norihiko Amikura (4 out of 47 patents)

Risako Miyoshi (4 out of 15 patents)

Kippei Sugita (3 out of 26 patents)

4. Jun Hirose (3 out of 42 patents)

5. Tatsuya Yamaguchi (2 out of 65 patents)

6. Hitoshi Kato (2 out of 225 patents)

7. Takayuki Katsunuma (2 out of 35 patents)

8. Kaoru Maekawa (2 out of 25 patents)

9. Kazuyuki Miura (2 out of 12 patents)

10. Takaya Kikai (2 out of 6 patents)

11. Kazutoshi Ishimaru (2 out of 5 patents)

12. Kazushi Kaneko (2 out of 30 patents)

13. Kensaku Narushima (2 out of 22 patents)

14. Junjun Liu (2 out of 18 patents)

15. Yuzo Ohishi (2 out of 9 patents)

Core Competencies:

Film Thickness Measurement

Substrate Processing

Plasma Processing

Gas Supply Systems

Pattern Formation

Semiconductor Manufacturing

Etching Techniques

Inspection Systems

Cleaning Methods

Vacuum Processing

Transfer Mechanisms

Low-K Materials

101 patents: Sort by Forward Citations

1. 11939665 - Film thickness measuring apparatus and film thickness measuring method, and film forming system and film forming method (2024-03-26),

2. 11674225 - Substrate processing apparatus (2023-06-13),

3. 11437251 - Substrate processing apparatus for producing mixed processing liquid (2022-09-06),

4. 11139185 - Substrate processing device and substrate transfer method (2021-10-05),

5. 10879100 - Substrate transfer device, substrate transfer method and recording medium (2020-12-29),

6. 10879069 - Method and apparatus for forming hard mask film and method for manufacturing semiconductor devices (2020-12-29),

7. 10879066 - Mask pattern forming method, fine pattern forming method, and film deposition apparatus (2020-12-29),

8. 10879060 - Substrate processing apparatus, method of manufacturing semiconductor device, and storage medium (2020-12-29),

9. 10879050 - Plasma processing apparatus, electrostatic attraction method, and electrostatic attraction program (2020-12-29),

10. 10879045 - Plasma processing apparatus (2020-12-29),

11. 10877376 - Light irradiating device (2020-12-29),

12. 10876870 - Method of determining flow rate of a gas in a substrate processing system (2020-12-29),

13. 10876204 - Substrate processing apparatus, exhaust pipe coating method and substrate processing method (2020-12-29),

14. 10872814 - Film forming method and film forming apparatus (2020-12-22),

15. 10872798 - Substrate transfer mechanism, substrate processing apparatus, and substrate transfer method (2020-12-22),

Tokyo Electron Limited (TEL) is a leading global supplier of semiconductor production equipment and flat panel display (FPD) manufacturing equipment. Founded in 1963 and headquartered in Tokyo, Japan, TEL specializes in the development and manufacturing of advanced technologies that enable the production of high-performance electronic devices. The company offers a wide range of products, including etching systems, deposition systems, and cleaning systems, which are essential for the fabrication of integrated circuits. With a strong commitment to innovation and sustainability, TEL plays a crucial role in the semiconductor industry, supporting the growth of next-generation technologies.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 9 2025

101 Patents

#469 in Tokyo

#1,091 in Japan

#7,481 in the World

Tokyo Electron Limi Ted

Forward Citations = 753

276 inventors:

Norihiko Amikura (4 out of 47 patents)

Risako Miyoshi (4 out of 15 patents)

Kippei Sugita (3 out of 26 patents)

4. Jun Hirose (3 out of 42 patents)

5. Tatsuya Yamaguchi (2 out of 65 patents)

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