Inventors with similar research interests:
Location History:
- Kofu, JP (1995 - 1997)
- Kanagawa-ken, JP (1997)
- Niimi, JP (1998)
- Nakano-ku, JP (1999)
- Fussa, JP (1993 - 2002)
- Kitakami, JP (1998 - 2003)
- Oxford, GB (2003)
- Esashi, JP (2005 - 2007)
- Ibaragi, JP (2005 - 2008)
- Tokyo, JP (1985 - 2009)
- Kai, JP (2009)
- Ibaraki, JP (2004 - 2012)
- Sagamihara, JP (2005 - 2013)
- Nirasaki, JP (2012 - 2013)
- Toride, JP (2007 - 2017)
- Oshu, JP (2011 - 2023)
- Iwate, JP (2014 - 2024)
Company Filing History:
101 out of 10,326 
78 out of 90,697 
10 out of 27,375 
Years Active: 1985-2025
Areas of Expertise:
Title: Hitoshi Kato: Pioneering Innovator and Patent Holder
Introduction:
In the realm of technological innovation, few individuals have left a mark as significant as Hitoshi Kato. Hailing from Iwate, Japan, Kato has emerged as a pioneering inventor and holder of an impressive 210 patents. With a particular focus on deposition methods and substrate processing, Kato has revolutionized the semiconductor industry with his groundbreaking inventions. This article delves into his latest patents, career highlights, notable collaborations, and his enduring contribution to the world of technology.
Latest Patents:
Kato's stellar career is highlighted by his latest patents. One notable patent is his "Deposition Method and Deposition Apparatus" where he describes an innovative technique for depositing a silicon film on a recessed surface. This method involves a multi-step process, including the deposition of an SiH molecular layer, exposure of a silicon atomic layer, and selective removal through anisotropic etching. This technique, with its meticulous precision and efficiency, has immense implications for semiconductor manufacturing.
Another significant patent of Kato is his "Substrate Processing Apparatus," which focuses on enhancing film formation by supplying a processing gas to a substrate. This apparatus incorporates a rotary table, a mounting stand, a processing gas supply part, a magnetic gear mechanism, and a rotating mechanism. This invention demonstrates Kato's relentless pursuit of finding innovative solutions to improve and streamline substrate processing techniques.
Career Highlights:
Kato's exceptional career has seen him contribute his unparalleled expertise to some of the most prominent industry players. He has worked at Tokyo Electron Limited, a renowned global leader in semiconductor and flat-panel-display manufacturing equipment. Additionally, he has been associated with Canon Kabushiki Kaisha, a Japanese multinational corporation known for its high-quality imaging and optical products. Kato's association with these esteemed companies further underscores his significant role in the technological advancement of the industry.
Collaborations:
Throughout his illustrious career, Kato has had the privilege of collaborating with highly accomplished peers. Notable among his collaborators are Naoki Ishikawa and Yasuo Fukatsu. These collaborations have yielded fruitful results, further solidifying Kato's position as an influential inventor.
Conclusion:
Hitoshi Kato's remarkable contribution to the field of innovations and patents cannot be understated. With an impressive roster of 210 patents, his expertise in deposition methods and substrate processing has reshaped the semiconductor industry. Through his groundbreaking inventions, Kato has significantly advanced the development of cutting-edge technologies. His career highlights, notable collaborations, and latest patents serve as a testament to his unwavering commitment to pushing the boundaries of innovation. As the world progresses further into the digital age, Hitoshi Kato's legacy will undoubtedly continue to inspire and shape the future of technological advancements.