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Jsr Corporation

USPTO Granted Patents = 1,064

CIPO Patents = 14

EPO Patents = 228

Trademarks = 60

Forward Citations = 6,493

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1,112 inventors (with patents filed for the assignee):

Tomoki Nagai (48 out of 48 patents)

Yukio Nishimura (40 out of 44 patents)

Tsutomu Shimokawa (36 out of 38 patents)

4. Toshihiro Tadaki (35 out of 37 patents)

5. Takehiko Naruoka (30 out of 30 patents)

6. Ken Maruyama (30 out of 30 patents)

7. Takuo Sone (28 out of 35 patents)

8. Hiromitsu Nakashima (28 out of 29 patents)

9. Hirokazu Sakakibara (27 out of 27 patents)

10. Nobuo Kawahashi (27 out of 32 patents)

11. Hiroshi Shiho (26 out of 28 patents)

12. Kinji Yamada (26 out of 31 patents)

13. Hiroyuki Komatsu (25 out of 43 patents)

14. Hisashi Nakagawa (25 out of 25 patents)

15. Masayuki Hattori (24 out of 87 patents)

Core Competencies:

Immunoglobulin-Binding Protein

Radiation-Sensitive Resin Composition

Chemical Structure Generating Device

Silicon-Containing Composition

Photosensitive Resin Composition

Chromatography Carrier

Chemical-Mechanical Polishing

Liquid Crystal Display Device

Enzyme Sensor

Affinity Carrier

Pattern-Forming Method

Stem Cell Purification

1,064 patents: Sort by Forward Citations

1. 12529958 - Photosensitive resin composition, method for producing resin film having pattern, resin film having pattern, and semiconductor circuit substrate (2026-01-20),

2. 12529144 - Composition, method of producing substrate, and polymer (2026-01-20),

3. 12517433 - Composition, resist underlayer film, method of forming film, method of producing patterned substrate, and compound (2026-01-06),

4. 12517429 - Radiation-sensitive resin composition and method for forming pattern (2026-01-06),

5. 12516134 - IMMUNOGLOBULIN-BINDING PROTEIN AND AFFINITY SUPPORT USING SAME (2026-01-06),

6. 12516074 - Composition, film, method of forming film, method of forming pattern, method of forming organic-underlayer-film reverse pattern, and method of producing composition (2026-01-06),

7. 12428451 - Immunoglobulin-binding protein, and affinity carrier using same (2025-09-30),

8. 12422748 - Radiation-sensitive resin composition and method for forming resist pattern (2025-09-23),

9. 12400740 - Chemical structure generating device, chemical structure generating program, and chemical structure generating method (2025-08-26),

10. 12386260 - Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound (2025-08-12),

11. 12378509 - Method for producing cell cluster group and device for producing same (2025-08-05),

12. 12372869 - Method for forming resist pattern and radiation-sensitive resin composition (2025-07-29),

13. 12353133 - Silicon-containing composition and method of producing semiconductor substrate (2025-07-08),

14. 12336406 - Display (2025-06-17),

15. 12332563 - Pattern-forming method and composition (2025-06-17),

JSR Corporation is a global company specializing in synthetic rubber, performance chemicals, and materials used in a wide range of industries. They leverage their leading-edge technologies, expertise, and partnerships to deliver innovative and sustainable solutions to their customers. JSR's diverse product portfolio caters to industries such as automotive, electronics, healthcare, energy, and more. With a commitment to quality, safety, and environmental sustainability, JSR Corporation is a trusted partner for businesses worldwide.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Jan 20 2026

1,064 Patents

#98 in Tokyo

#210 in Japan

#925 in the World

Jsr Corporation

Forward Citations = 6,493

1,112 inventors:

Tomoki Nagai (48 out of 48 patents)

Yukio Nishimura (40 out of 44 patents)

Tsutomu Shimokawa (36 out of 38 patents)

4. Toshihiro Tadaki (35 out of 37 patents)

5. Takehiko Naruoka (30 out of 30 patents)

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