Tokyo, Japan

Takehiko Naruoka

This inventor holds 30 USPTO granted patents and 17 published patent applications, primarily in Pattern Formation. Top assignees: Jsr Corporation, Osaka University, Tokyo Electron Limited. Active years: 2013-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takehiko Naruoka. Retrieved from https://idiyas.com/inventor/takehiko-naruoka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 30 

% Patents Active = 100.0

Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2013-2023

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Areas of Expertise:
Pattern Formation
Chemically Amplified Resist
Radiation-Sensitive Composition
Film Formation
Directed Self-Assembly
Resist Patterning
Block Copolymer
Surface Modification
Composition Methods
Film-Forming Method
Polymer Production
Resist Pattern-Forming
30 patents (USPTO):Explore Patents

Title: The Innovative Mind of Takehiko Naruoka: Pioneering Inventor from Tokyo

Introduction:

Takehiko Naruoka, a distinguished inventor hailing from Tokyo, Japan, has made significant contributions to the field of material science and surface modification. With an impressive portfolio of 30 patents to his name, Naruoka's ingenuity and creativity have fueled groundbreaking innovations in the realm of directed self-assembly lithography processes and selective surface modifications.

Latest Patents:

Naruoka's latest patents showcase his expertise in developing advanced compositions for film formation and directed self-assembly lithography processes. One notable patent includes a method and composition for selectively modifying base material surfaces, utilizing polymers with specific functional groups to achieve precise surface alterations. Another patent focuses on a composition for film formation, employing polymers with tailored repeating units to enhance film quality and performance.

Career Highlights:

Having worked at esteemed institutions such as JSR Corporation and Osaka University, Naruoka has honed his skills and expertise in material science and nanotechnology. His career highlights include spearheading research projects that have led to the development of innovative solutions for various industrial applications.

Collaborations:

Throughout his career, Naruoka has collaborated with accomplished individuals in the field, including notable coworkers such as Tomoki Nagai and Hiroyuki Komatsu. These collaborations have played a pivotal role in fostering a culture of innovation and knowledge exchange, ultimately driving forward the boundaries of scientific discovery.

Conclusion:

In conclusion, Takehiko Naruoka stands as a visionary inventor whose relentless pursuit of innovation has left an indelible mark on the world of material science and surface engineering. His exceptional patents, coupled with his collaborative spirit and extensive experience, underscore his enduring impact on the field. As he continues to push the boundaries of scientific advancement, Naruoka's legacy as a pioneering inventor from Tokyo remains a testament to the power of ingenuity and dedication in shaping a brighter future for us all.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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