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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11335559 B1

PDFFull Text
Date of Patent:
May. 17, 2022

Filed:

Jul. 28, 2020

Pattern-forming method, and composition

Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Hiroyuki Komatsu, Tokyo, JP;

Tomohiro Oda, Tokyo, JP;

Masafumi Hori, Tokyo, JP;

Takehiko Naruoka, Tokyo, JP;

Tomoki Nagai, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Thomas T Pham

Int. Cl.
CPC ...
H01L 21/027 (2006.01); H01L 21/308 (2006.01); H01L 21/3065 (2006.01); H01L 21/768 (2006.01); C08L 53/00 (2006.01); C08F 212/08 (2006.01); C08F 293/00 (2006.01); C08F 12/08 (2006.01); C08F 20/14 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0275 (2013.01); C08F 12/08 (2013.01); C08F 20/14 (2013.01); C08F 212/08 (2013.01); C08F 293/005 (2013.01); C08L 53/00 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/16 (2013.01); G03F 7/20 (2013.01); G03F 7/2006 (2013.01); G03F 7/2041 (2013.01); G03F 7/322 (2013.01); G03F 7/325 (2013.01); H01L 21/0271 (2013.01); H01L 21/76802 (2013.01); H01L 21/76816 (2013.01); H01L 21/76831 (2013.01); C08F 2438/01 (2013.01);
Abstract

A pattern-forming method includes: forming a pattern on an upper face side of a substrate; applying a first composition to a sidewall of the pattern; forming a resin layer by applying a second composition to an inner face side of the sidewall of the pattern coated with the first composition; allowing the resin layer to separate into a plurality of phases; and removing at least one of the plurality of phases. The first composition contains a first polymer. The second composition contains a second polymer. The second polymer includes a first block having a first structural unit and a second block having a second structural unit. The polarity of the second structural unit is higher than the polarity of the first structural unit. Immediately before forming of the resin layer, a static contact angle θ (°) of water on the sidewall of the pattern satisfies inequality (1).

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