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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10018911 B1

PDFFull Text
Date of Patent:
Jul. 10, 2018

Filed:

Nov. 09, 2016

Chemically amplified resist material and resist pattern-forming method

Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Hisashi Nakagawa, Tokyo, JP;

Takehiko Naruoka, Tokyo, JP;

Tomoki Nagai, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/16 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); C07C 381/12 (2006.01); G03F 7/38 (2006.01); H01L 21/027 (2006.01); C07D 307/77 (2006.01); C08F 220/38 (2006.01); C08F 220/18 (2006.01); C08F 220/26 (2006.01); C08F 220/24 (2006.01); C08F 220/22 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0046 (2013.01); C07C 381/12 (2013.01); C07D 307/77 (2013.01); C08F 220/18 (2013.01); C08F 220/22 (2013.01); C08F 220/24 (2013.01); C08F 220/26 (2013.01); C08F 220/38 (2013.01); G03F 7/0397 (2013.01); G03F 7/168 (2013.01); G03F 7/2022 (2013.01); G03F 7/38 (2013.01); H01L 21/0274 (2013.01);
Abstract

A chemically amplified resist material comprises a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The radiation-sensitive acid-and-sensitizer generating agent or the radiation-sensitive acid generating agent included in the generative component comprises the first compound that is radiation-sensitive and second compound that is radiation-sensitive. The first compound includes a first onium cation and a first anion, and the second compound includes a second onium cation and a second anion that is different from the first anion. Each of an energy released upon reduction of the first onium cation to a radical and an energy released upon reduction of the second onium cation to a radical is less than 5.0 eV.

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