Tokyo, Japan

Hisashi Nakagawa

USPTO Granted Patents = 25 

 

Average Co-Inventor Count = 3.8

ph-index = 4

Forward Citations = 39(Granted Patents)


Location History:

  • Belmont, MA (US) (2012)
  • Tsukuba, JP (2008 - 2013)
  • Tokyo, JP (2015 - 2022)

Company Filing History:


Years Active: 2008-2022

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25 patents (USPTO):Explore Patents

Title: The Visionary Inventor: Hisashi Nakagawa's Innovation Journey

Introduction: Hisashi Nakagawa, a visionary inventor based in Tokyo, Japan, has made a profound impact on the global tech community with his relentless pursuit of innovation and passion for pushing the boundaries of technology. With 25 patents to his name, Nakagawa is recognized for his groundbreaking contributions to the field of radiation-sensitive compositions and resist pattern-forming methods.

Latest Patents: Nakagawa's latest patents include a radiation-sensitive composition and resist pattern-forming method that revolutionize the industry. This composition contains a unique polymetalloxane and a radiation-sensitive acid generator, setting a new standard for precision and efficiency in pattern formation.

Career Highlights: Nakagawa's career is adorned with significant achievements, having worked with prestigious companies such as JSR Corporation and Osaka University. His expertise and dedication have led to the development of cutting-edge technologies that have reshaped the landscape of the tech industry.

Collaborations: Throughout his journey, Nakagawa has collaborated with esteemed professionals in the field, including Takehiko Naruoka and Masahiro Akiyama, who have contributed to the success of his innovative projects. Their combined efforts have propelled Nakagawa's inventions to new heights of excellence.

Conclusion: Hisashi Nakagawa's legacy as a visionary inventor is firmly established, with his inventive spirit and commitment to technological advancement leaving an indelible mark on the global tech landscape. His innovative contributions continue to inspire future generations of inventors and shape the course of technological evolution.

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