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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9989849 B1

PDFFull Text
Date of Patent:
Jun. 05, 2018

Filed:

Nov. 09, 2016

Chemically amplified resist material and resist pattern-forming method

Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Hisashi Nakagawa, Tokyo, JP;

Takehiko Naruoka, Tokyo, JP;

Tomoki Nagai, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/16 (2006.01); G03F 7/025 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01); H01L 21/027 (2006.01); G03F 7/039 (2006.01); C08F 220/22 (2006.01); C07D 409/14 (2006.01); C07C 381/12 (2006.01); C08F 220/14 (2006.01); C07C 303/32 (2006.01); C08F 220/28 (2006.01); C07C 309/07 (2006.01); C08F 220/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0046 (2013.01); C07C 303/32 (2013.01); C07C 309/07 (2013.01); C07C 381/12 (2013.01); C07D 409/14 (2013.01); C08F 220/14 (2013.01); C08F 220/22 (2013.01); C08F 220/28 (2013.01); C08F 220/38 (2013.01); G03F 7/025 (2013.01); G03F 7/0397 (2013.01); G03F 7/168 (2013.01); G03F 7/2002 (2013.01); G03F 7/32 (2013.01); G03F 7/38 (2013.01); H01L 21/0274 (2013.01);
Abstract

A chemically amplified resist material comprises a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The radiation-sensitive acid generating agent included in the generative component comprises a compound represented by the formula (B). Rand Reach independently represent a monovalent organic group, or taken together represent a cyclic structure together with the O—C—O. At least one of Rand Rcomprises a halogen atom, a nitro group, a cyano group, a formyl group, a carbonyl group, a carboxy group, a sulfo group, a sulfonyl group or a combination thereof, or the cyclic structure having 4 to 30 ring atoms is a spiro cyclic structure, a fused cyclic structure or a bridged cyclic structure.

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