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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11506976 B1

PDFFull Text
Date of Patent:
Nov. 22, 2022

Filed:

Jan. 31, 2020

Radiation-sensitive composition and resist pattern-forming method

Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Hisashi Nakagawa, Tokyo, JP;

Yusuke Asano, Tokyo, JP;

Shinya Minegishi, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Daborah Chacko-Davis

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/038 (2006.01); C08G 79/00 (2006.01); C08G 79/12 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/038 (2013.01); C08G 79/00 (2013.01); C08G 79/12 (2013.01); G03F 7/0045 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2002 (2013.01); G03F 7/30 (2013.01); G03F 7/38 (2013.01);
Abstract

A radiation-sensitive composition contains: a polymetalloxane including a structural unit represented by formula (1); a radiation-sensitive acid generator; and a solvent. In the following formula (1), M represents a germanium atom, a tin atom or a lead atom; Arrepresents a substituted or unsubstituted aryl group having 6 to 20 ring atoms or a substituted or unsubstituted heteroaryl group having 5 to 20 ring atoms; Rrepresents a monovalent organic group having 1 to 20 carbon atoms, a hydrogen atom, a halogen atom or a hydroxy group; and n is 2 or 3.

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Nakagawa, Hisashi. (2022). Radiation-sensitive composition and resist pattern-forming method (U.S. Patent No. 11506976). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11506976

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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