Tokyo, Japan

Shinya Minegishi

This inventor holds 20 USPTO granted patents and 9 published patent applications, primarily in Pattern Formation Technology. Top assignee: Jsr Corporation. Active years: 2014-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shinya Minegishi. Retrieved from https://idiyas.com/inventor/shinya-minegishi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20 

% Patents Active = 100.0

Average Co-Inventor Count = 4.2

ph-index = 3

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 2014-2022

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Areas of Expertise:
Radiation-Sensitive Composition
Pattern-Forming Method
Directed Self-Assembly
Photoresist Composition
Block Copolymer
Base Film-Forming Composition
Resist Underlayer Film
Liquid Immersion Film
20 patents (USPTO):Explore Patents

Title: Shinya Minegishi: Innovator in Radiation-Sensitive Compositions

Introduction

Shinya Minegishi, a prominent inventor based in Tokyo, Japan, has made significant contributions to the field of radiation-sensitive compositions. With an impressive portfolio of 20 patents, he is recognized for his innovative work that enhances various industrial applications.

Latest Patents

Shinya Minegishi's latest patents focus on advanced radiation-sensitive compositions and methods for forming resist patterns. One patent describes a radiation-sensitive composition comprising a polymetalloxane with specific structural units, including a radiation-sensitive acid generator and a solvent. This formula incorporates germanium, tin, or lead atoms, along with an aryl or heteroaryl group. Another patent advances the field by detailing a composition for use in exposure with extreme ultraviolet rays or electron beams, featuring a polymer that bonds metal and carbon atoms through covalent bonds, specifically including tin, germanium, and lead.

Career Highlights

As an accomplished inventor, Shinya Minegishi works at JSR Corporation, a leader in advanced materials and technologies. He has dedicated his career to innovating in the area of radiation-sensitive materials, pushing the boundaries of what is possible in the semiconductor and electronics industries.

Collaborations

Throughout his career, Minegishi has collaborated with a talented team, including notable coworkers Tomoki Nagai and Hiroyuki Komatsu. Together, they have contributed to advancing technology in the field, fostering an environment of creativity and innovation.

Conclusion

With his extensive patent portfolio and collaborative spirit, Shinya Minegishi continues to be a driving force in the development of radiation-sensitive compositions. His work at JSR Corporation exemplifies the importance of innovation in maintaining technological advancement in today's rapidly evolving landscape.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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