The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2017
Filed:
Sep. 19, 2014
Applicant:
Jsr Corporation, Tokyo, JP;
Inventors:
Assignee:
JSR CORPORATION, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/038 (2006.01); H01L 21/027 (2006.01); G03F 7/039 (2006.01); G03F 7/32 (2006.01); G03F 7/20 (2006.01); C08F 220/26 (2006.01); C08F 220/34 (2006.01); G03F 7/11 (2006.01); C08F 220/18 (2006.01);
U.S. Cl.
CPC ...
G03F 7/038 (2013.01); C08F 220/26 (2013.01); C08F 220/34 (2013.01); G03F 7/0045 (2013.01); G03F 7/0382 (2013.01); G03F 7/0397 (2013.01); G03F 7/2041 (2013.01); G03F 7/325 (2013.01); H01L 21/0275 (2013.01); C08F 220/18 (2013.01); G03F 7/11 (2013.01);
Abstract
A resist pattern-forming method includes forming a resist film using a photoresist composition. The resist film is exposed. The exposed resist film is developed. The photoresist composition includes an acid generator and a polymer. The acid generator generates a protonic acid upon application of exposure light. The protonic acid generates a proton. The polymer includes a first structural unit which includes a first group. The first group and the proton form a cationic group. The polymer substantially does not include a structural unit which includes an acid-labile group.