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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9599892 B1

PDFFull Text
Date of Patent:
Mar. 21, 2017

Filed:

Mar. 25, 2015

Composition for pattern formation, and pattern-forming method

Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Hiroyuki Komatsu, Tokyo, JP;

Takehiko Naruoka, Tokyo, JP;

Shinya Minegishi, Tokyo, JP;

Tomoki Nagai, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Sin Lee

Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01); G03F 7/40 (2006.01); G03F 7/36 (2006.01); H01L 21/027 (2006.01); G03F 7/32 (2006.01); C08K 5/42 (2006.01); H01L 21/311 (2006.01); C08F 297/02 (2006.01); C08L 53/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); C08F 297/026 (2013.01); C08K 5/42 (2013.01); G03F 7/0035 (2013.01); G03F 7/2041 (2013.01); G03F 7/322 (2013.01); G03F 7/36 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); H01L 21/0271 (2013.01); H01L 21/0274 (2013.01); H01L 21/31133 (2013.01); H01L 21/31138 (2013.01); C08L 53/00 (2013.01);
Abstract

A composition for pattern formation includes a block copolymer and a solvent. The block copolymer includes a group including a reactive group on at least one end of a main chain of the block copolymer. A pattern-forming method includes providing a directed self-assembling film directly or indirectly on a substrate using the composition. The directed self-assembling film includes a phase separation structure which includes a plurality of phases. A part of the plurality of phases of the directed self-assembling film is removed.

Find Patent Forward Citations

Komatsu, Hiroyuki. (2017). Composition for pattern formation, and pattern-forming method (U.S. Patent No. 9599892). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9599892

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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