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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9587065 B1

PDFFull Text
Date of Patent:
Mar. 07, 2017

Filed:

May. 01, 2015

Composition for pattern formation, and pattern-forming method

Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Hiroyuki Komatsu, Tokyo, JP;

Shinya Minegishi, Tokyo, JP;

Takehiko Naruoka, Tokyo, JP;

Tomoki Nagai, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
C08F 297/02 (2006.01); C08F 293/00 (2006.01); G03F 7/16 (2006.01); C08L 53/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
C08F 297/026 (2013.01); C08F 293/00 (2013.01); C08L 53/00 (2013.01); G03F 7/16 (2013.01); G03F 7/168 (2013.01); G03F 7/20 (2013.01);
Abstract

A composition for pattern formation includes a block copolymer. The block polymer includes a first labile group at an end of a main chain of the block copolymer. The first acid liable group is capable of being dissociated by an acid or heat. The composition preferably further contains an acid generator that generates an acid upon application of an energy. The block copolymer is preferably capable of forming a phase separation structure through directed self-assembly. The first labile group is preferably represented by formula (a). R represents a monovalent organic group having 1 to 20 carbon atoms; R' represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and * denotes a binding site to an atom at the end of the main chain of the block copolymer.

Find Patent Forward Citations

Komatsu, Hiroyuki. (2017). Composition for pattern formation, and pattern-forming method (U.S. Patent No. 9587065). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9587065

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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