The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2021
Filed:
Apr. 16, 2019
Applicant:
Jsr Corporation, Tokyo, JP;
Inventors:
Assignee:
JSR CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 297/02 (2006.01); B81C 1/00 (2006.01); C08L 53/00 (2006.01); H01L 21/308 (2006.01); H01L 21/3213 (2006.01); H01L 21/033 (2006.01); G03F 7/00 (2006.01); G03F 7/20 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
C08F 297/026 (2013.01); B81C 1/00031 (2013.01); C08L 53/005 (2013.01); G03F 7/0002 (2013.01); G03F 7/0035 (2013.01); G03F 7/70 (2013.01); H01L 21/0273 (2013.01); H01L 21/0337 (2013.01); H01L 21/3086 (2013.01); H01L 21/32139 (2013.01); B81C 2201/0149 (2013.01);
Abstract
A directed self-assembling composition for pattern formation includes a block copolymer. The block copolymer includes a polystyrene block having a styrene unit, and a polyalkyl (meth)acrylate block having an alkyl (meth)acrylate unit. The block copolymer has a group that is bound to at least one end of a main chain of the block copolymer and that includes a hetero atom.