Tokyo, Japan

Ken Maruyama

USPTO Granted Patents = 30 

Average Co-Inventor Count = 1.8

ph-index = 3

Forward Citations = 34(Granted Patents)


Company Filing History:


Years Active: 2011-2025

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30 patents (USPTO):Explore Patents

Title: Ken Maruyama: Innovator in Radiation-Sensitive Resin Technologies

Introduction: Ken Maruyama is a renowned inventor based in Tokyo, Japan, who has made significant contributions to the field of radiation-sensitive resin compositions. With a remarkable portfolio that includes 29 patents, Maruyama's work continues to push the boundaries of innovation in materials science.

Latest Patents: Among his latest innovations, Maruyama developed a radiation-sensitive resin composition that features a unique resin structure as outlined in his patent documentation. The resin includes components represented by designated formulas, wherein R and R' are variable hydrocarbon groups. These groups contribute to the functionality of the resin, ensuring that no fluorine atoms bond to specific carbon atoms within the structure, which is critical in achieving desirable properties for resist patterns. This innovation is central to the advancement of methods for forming resist patterns in various applications.

Another groundbreaking patent by Maruyama involves a similar radiation-sensitive resin composition, which comprises a polymer with acid-labile groups and compounds indicated by his innovative formulas. This composition integrates halogen atoms and hydrocarbon groups to further enhance its effectiveness, showcasing Maruyama's commitment to developing pioneering technologies.

Career Highlights: Ken Maruyama is currently affiliated with JSR Corporation, a leading company in materials and semiconductor technology. Throughout his career, he has consistently exhibited a strong focus on the development of advanced resin compositions, which have gained recognition and application in multiple high-tech industries.

Collaborations: Maruyama collaborates with distinguished colleagues, including Toshiyuki Kai and Daisuke Shimizu. Together, they have worked on several projects aimed at revolutionizing the fields of semiconductor and materials science, underscoring the value of teamwork in fostering innovation.

Conclusion: Ken Maruyama's extensive patent portfolio and innovative spirit mark him as a pivotal figure in the realm of radiation-sensitive technologies. His contributions at JSR Corporation and collaborative efforts with top professionals underscore his dedication to advancing the frontier of materials innovation. With ongoing research and development, Maruyama is poised to shape the future of resin compositions and their applications.

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