The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2015
Filed:
Feb. 05, 2013
Applicant:
Jsr Corporation, Tokyo, JP;
Inventor:
Ken Maruyama, Tokyo, JP;
Assignee:
JSR Corporation, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 309/06 (2006.01); C07C 309/25 (2006.01); G03C 1/73 (2006.01); C07C 25/18 (2006.01); C07C 381/12 (2006.01); C07D 307/93 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03C 1/73 (2013.01); C07C 25/18 (2013.01); C07C 309/06 (2013.01); C07C 309/25 (2013.01); C07C 381/12 (2013.01); C07D 307/93 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/2041 (2013.01); C07C 2101/04 (2013.01); C07C 2101/08 (2013.01); C07C 2101/14 (2013.01); C07C 2101/18 (2013.01);
Abstract
A radiation-sensitive composition includes a photoacid generator represented by a general formula (1), and a solvent. Each Rindependently represents a hydrogen atom, a fluorine atom, or a substituted or unsubstituted monovalent organic group. Rrepresents a fluorine atom or a substituted or unsubstituted monovalent organic group. Rrepresents a fluorine atom or a substituted or unsubstituted monovalent organic group. Rrepresents a fluoromethylene group or a divalent fluoroalkylene group. Mrepresents a monovalent onium cation. Optionally Rbonds to Ror Rto form a cyclic structure.