logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11747725 B1

PDFFull Text
Date of Patent:
Sep. 05, 2023

Filed:

Apr. 16, 2018

Radiation-sensitive resin composition and method for forming resist pattern

Applicant:

Jsr Corporation, Tokyo, JP;

Inventor:

Ken Maruyama, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Element IP, PLC

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/38 (2006.01); C07C 303/32 (2006.01); C07C 309/06 (2006.01); C07C 309/12 (2006.01); C07C 309/19 (2006.01); C07C 309/24 (2006.01); C07C 381/12 (2006.01); G03F 7/039 (2006.01); G03F 7/30 (2006.01); G03F 7/16 (2006.01); G03F 7/40 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 303/32 (2013.01); C07C 309/06 (2013.01); C07C 309/12 (2013.01); C07C 309/19 (2013.01); C07C 309/24 (2013.01); C07C 381/12 (2013.01); G03F 7/0046 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2006 (2013.01); G03F 7/2041 (2013.01); G03F 7/30 (2013.01); G03F 7/327 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01);
Abstract

A radiation-sensitive resin composition includes: a resin including a structure unit having an acid-dissociable group; a radiation-sensitive acid generator; and a solvent. The radiation-sensitive acid generator includes at least two of compounds represented by formulae (1) to (3), provided that the compound represented by formula (1) and the compound represented by formula (3) within the scope of the compound represented by formula (2) are excluded. In the formulae (1) to (3), R, Rand Rare each independently a group having a cyclic structure; X, X, X, X, Xand Xare each independently a hydrogen atom, a fluorine atom, or a fluorinated hydrocarbon group, provided that both Xand X, both Xand X, and both Xand Xare not a hydrogen atom, respectively.

Find Patent Forward Citations

Loading…